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Koji Yonemura
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Kanagawa, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive resin composition and method of forming pattern
Patent number
8,216,763
Issue date
Jul 10, 2012
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and method of forming resist pattern
Patent number
8,187,789
Issue date
May 29, 2012
Tokyo Ohka Kogyo Co., Ltd.
Koji Yonemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition for thin-film implantation process and...
Patent number
7,910,281
Issue date
Mar 22, 2011
Tokyo Ohka Kogyo Co., Ltd.
Takako Suzuki
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20090269700
Publication date
Oct 29, 2009
Tokyo Ohka Kogyo Co., Ltd.
Koji Yonemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
Publication number
20090220889
Publication date
Sep 3, 2009
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE RESIST COMPOSITION FOR THIN-FILM IMPLANTATION PROCESS AND...
Publication number
20090029291
Publication date
Jan 29, 2009
Tokyo Ohka Kogyo Co., Ltd.
Takako Suzuki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAY...
Publication number
20080312400
Publication date
Dec 18, 2008
Tokyo Ohka Kogyo Co., Ltd.
Naoki YAMASHITA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Composition for formation of antireflection film, and antireflectio...
Publication number
20060292488
Publication date
Dec 28, 2006
Tokyo Ohka Kogyo Co., Ltd.
Toshikazu Takayama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...