Kojiro TAKAHASHI

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Isehara, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming SOI substrate and apparatus for forming the same
- Patent number 8,802,534
- Issue date Aug 12, 2014
- Semiconductor Energy Laboratory Co., Ltd.
- Yoshihiro Komatsu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING SOI SUBSTRATE AND APPARATUS FOR FORMING THE SAME
- Publication number 20120322228
- Publication date Dec 20, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Yoshihiro KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS AND PLASMA CVD APPARATUS
- Publication number 20120100309
- Publication date Apr 26, 2012
- Semiconductor Energy Laboratory Co., Ltd.
- Hidekazu MIYAIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...