Koki MUKAIYAMA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method, component processing method, and subst...
- Patent number 11,798,793
- Issue date Oct 24, 2023
- Tokyo Electron Limited
- Satoshi Ohuchida
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240355589
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213032
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240203698
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-Temperature Etch
- Publication number 20240112919
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030010
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBST...
- Publication number 20240006168
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Satoshi OHUCHIDA
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230307245
- Publication date Sep 28, 2023
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20230135998
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Satoshi OHUCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBST...
- Publication number 20220238315
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Satoshi OHUCHIDA
- B08 - CLEANING

Koki MUKAIYAMA

Person

Patents Grantslast 30 patents

Substrate processing method, component processing method, and subst...

Patents Applicationslast 30 patents

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

Low-Temperature Etch

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBST...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBST...