Kolake Mayya Subramanya

Person

Gyeonggi-do, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
- Patent number 8,241,837
- Issue date Aug 14, 2012
- Samsung Electronics Co., Ltd.
- Jung-Hwan Hah
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nano filament structure and methods of forming the same
- Patent number 8,125,131
- Issue date Feb 28, 2012
- Samsung Electronics Co., Ltd.
- Subramanya Mayya Kolake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 7,915,668
- Issue date Mar 29, 2011
- Samsung Electronics Co., Ltd.
- Subramanya Mayya Kolake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask pattern for semiconductor device fabrication, method of formin...
- Patent number 7,851,125
- Issue date Dec 14, 2010
- Samsung Electronics Co., Ltd.
- Jung-Hwan Hah
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of forming nanoparticle based monolayer films with high par...
- Patent number 7,344,773
- Issue date Mar 18, 2008
- Samsung Electronics Co., Ltd.
- Kolake Mayya Subramanya
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMIN...
- Publication number 20110059613
- Publication date Mar 10, 2011
- Jung-Hwan Hah
- B82 - NANO-TECHNOLOGY
Information Patent Application
Nano Filament Structure and Methods of Forming the Same
- Publication number 20090322200
- Publication date Dec 31, 2009
- Subramanya Mayya Kolake
- G11 - INFORMATION STORAGE
Information Patent Application
Semiconductor device and method for forming the same
- Publication number 20080096306
- Publication date Apr 24, 2008
- Subramanya Mayya Kolake
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF FORMING CARBON NANOTUBES
- Publication number 20070053824
- Publication date Mar 8, 2007
- Samsung Electronics Co., Ltd.
- Kolake Mayya Subramanya
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Methods of forming nanoparticle based monolayer films with high par...
- Publication number 20060099430
- Publication date May 11, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Kolake Mayya Subramanya
- G11 - INFORMATION STORAGE
Information Patent Application
Mask pattern for semiconductor device fabrication, method of formin...
- Publication number 20060046205
- Publication date Mar 2, 2006
- Jung-Hwan Hah
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask pattern for semiconductor device fabrication, method of formin...
- Publication number 20050227492
- Publication date Oct 13, 2005
- SAMSUNG ELECTRONICS CO., LTD.
- Jung-Hwan Hah
- B82 - NANO-TECHNOLOGY

Kolake Mayya Subramanya

Person

Patents Grantslast 30 patents

Mask pattern for semiconductor device fabrication, method of formin...

Nano filament structure and methods of forming the same

Semiconductor device and method for forming the same

Mask pattern for semiconductor device fabrication, method of formin...

Methods of forming nanoparticle based monolayer films with high par...

Patents Applicationslast 30 patents

MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMIN...

Nano Filament Structure and Methods of Forming the Same

Semiconductor device and method for forming the same

METHOD OF FORMING CARBON NANOTUBES

Methods of forming nanoparticle based monolayer films with high par...

Mask pattern for semiconductor device fabrication, method of formin...

Mask pattern for semiconductor device fabrication, method of formin...