Kong Lung Samuel Chan

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Newark, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Thermal chamber with improved thermal uniformity
- Patent number 11,978,646
- Issue date May 7, 2024
- Applied Materials, Inc.
- Dongming Iu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 11,348,769
- Issue date May 31, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced anneal chamber for wafer outgassing
- Patent number 10,770,272
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Lara Hawrylchak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber
- Patent number 10,741,428
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Aaron Muir Hunter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead for a semiconductor processing chamber
- Patent number D790039
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- Lara Hawrylchak
- D23 - Environmental heating and cooling

Patents Applicationslast 30 patents

Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20200402780
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CHAMBER WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20180337075
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Dongming IU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20170294325
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Aaron Muir HUNTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ANNEAL CHAMBER FOR WAFER OUTGASSING
- Publication number 20170294292
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RTP PROCESS FOR DIRECTED SELF-ALIGNED PATTERNS
- Publication number 20170221701
- Publication date Aug 3, 2017
- Applied Materials, Inc.
- Aaron Muir HUNTER
- H01 - BASIC ELECTRIC ELEMENTS