Korehito KATO

Person

Gunma, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Dry etching method or dry cleaning method
- Patent number 11,814,726
- Issue date Nov 14, 2023
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching gas composition comprising sulfur-containing fluorocarb...
- Patent number 11,814,561
- Issue date Nov 14, 2023
- Kanto Denka Kogyo Co., Ltd.
- Hisashi Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching gas composition comprising sulfur-containing fluorocarb...
- Patent number 11,795,396
- Issue date Oct 24, 2023
- Kanto Denka Kogyo Co., Ltd.
- Hisashi Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching gas composition comprising sulfur-containing fluorocarb...
- Patent number 11,795,397
- Issue date Oct 24, 2023
- Kanto Denka Kogyo Co., Ltd.
- Hisashi Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method or dry cleaning method
- Patent number 11,584,989
- Issue date Feb 21, 2023
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method of semiconductor manufacturing device
- Patent number 11,434,565
- Issue date Sep 6, 2022
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching gas composition and dry etching method
- Patent number 11,437,244
- Issue date Sep 6, 2022
- Kanto Denka Kogyo Co., Ltd.
- Korehito Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using gas molecule containing sulfur atom
- Patent number 11,315,797
- Issue date Apr 26, 2022
- Kanto Denka Kogyo Co., Ltd.
- Korehito Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching using acid halide
- Patent number 11,183,393
- Issue date Nov 23, 2021
- Kanto Denka Kogyo Co., Ltd.
- Korehito Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feeding process of chlorine fluoride
- Patent number 10,899,615
- Issue date Jan 26, 2021
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas composition for dry etching and dry etching method
- Patent number 10,629,449
- Issue date Apr 21, 2020
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas composition for dry etching and dry etching method
- Patent number 10,431,472
- Issue date Oct 1, 2019
- Kanto Denka Kogyo Co., Ltd.
- Yoshinao Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etching gas composition for silicon compound, and etching method
- Patent number 10,287,499
- Issue date May 14, 2019
- KANTO DENKA KOGYO CO., LTD.
- Yoshinao Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
DRY ETCHING METHOD OR DRY CLEANING METHOD
- Publication number 20230131072
- Publication date Apr 27, 2023
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- B08 - CLEANING
Information Patent Application
PURIFICATION METHOD FOR FLUOROOLEFIN HAVING STRUCTURE OF =CF2 OR =C...
- Publication number 20220281785
- Publication date Sep 8, 2022
- Kanto Denka Kogyo Co., LTD.
- Yuka MATSUTA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...
- Publication number 20220135882
- Publication date May 5, 2022
- Kanto Denka Kogyo Co., LTD.
- Hisashi SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...
- Publication number 20220135881
- Publication date May 5, 2022
- Kanto Denka Kogyo Co., LTD.
- Hisashi SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...
- Publication number 20210391178
- Publication date Dec 16, 2021
- Kanto Denka Kogyo Co., LTD.
- Hisashi SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...
- Publication number 20210388264
- Publication date Dec 16, 2021
- Kanto Denka Kogyo Co., LTD.
- Hisashi SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING USING ACID HALIDE
- Publication number 20210287911
- Publication date Sep 16, 2021
- KANTO DENKA KOGYO CO., LTD.
- Korehito KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD USING GAS MOLECULE CONTAINING SULFUR ATOM
- Publication number 20210233774
- Publication date Jul 29, 2021
- Kanto Denka Kogyo Co., LTD.
- Korehito KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OR DRY CLEANING METHOD
- Publication number 20210108311
- Publication date Apr 15, 2021
- Yoshinao TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHING GAS COMPOSITION AND DRY ETCHING METHOD
- Publication number 20200234962
- Publication date Jul 23, 2020
- KANTO DENKA KOGYO CO.,LTD.
- Korehito KATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20190112705
- Publication date Apr 18, 2019
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FEEDING PROCESS OF CHLORINE FLUORIDE
- Publication number 20190055124
- Publication date Feb 21, 2019
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- B08 - CLEANING
Information Patent Application
GAS COMPOSITION FOR DRY ETCHING AND DRY ETCHING METHOD
- Publication number 20190057878
- Publication date Feb 21, 2019
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING GAS COMPOSITION FOR SILICON COMPOUND, AND ETCHING METHOD
- Publication number 20180251679
- Publication date Sep 6, 2018
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
GAS COMPOSITION FOR DRY ETCHING AND DRY ETCHING METHOD
- Publication number 20180108537
- Publication date Apr 19, 2018
- Kanto Denka Kogyo Co., LTD.
- Yoshinao TAKAHASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Korehito KATO

Person

Patents Grantslast 30 patents

Dry etching method or dry cleaning method

Dry etching gas composition comprising sulfur-containing fluorocarb...

Dry etching gas composition comprising sulfur-containing fluorocarb...

Dry etching gas composition comprising sulfur-containing fluorocarb...

Dry etching method or dry cleaning method

Cleaning method of semiconductor manufacturing device

Dry etching gas composition and dry etching method

Plasma etching method using gas molecule containing sulfur atom

Atomic layer etching using acid halide

Feeding process of chlorine fluoride

Gas composition for dry etching and dry etching method

Gas composition for dry etching and dry etching method

Etching gas composition for silicon compound, and etching method

Patents Applicationslast 30 patents

DRY ETCHING METHOD OR DRY CLEANING METHOD

PURIFICATION METHOD FOR FLUOROOLEFIN HAVING STRUCTURE OF =CF2 OR =C...

DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...

DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...

DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...

DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARB...

ATOMIC LAYER ETCHING USING ACID HALIDE

PLASMA ETCHING METHOD USING GAS MOLECULE CONTAINING SULFUR ATOM

DRY ETCHING METHOD OR DRY CLEANING METHOD

DRY ETCHING GAS COMPOSITION AND DRY ETCHING METHOD

CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING DEVICE

FEEDING PROCESS OF CHLORINE FLUORIDE

GAS COMPOSITION FOR DRY ETCHING AND DRY ETCHING METHOD

ETCHING GAS COMPOSITION FOR SILICON COMPOUND, AND ETCHING METHOD

GAS COMPOSITION FOR DRY ETCHING AND DRY ETCHING METHOD