Korekazu Ueyama

Person

Takarazuka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device, and method for manufacturing the same
- Patent number 7,385,276
- Issue date Jun 10, 2008
- Rohm Co., Ltd.
- Yoshiaki Oku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,220,684
- Issue date May 22, 2007
- Rohm Co., Ltd.
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method for semiconductor device
- Patent number 7,166,545
- Issue date Jan 23, 2007
- Rohm Co., Ltd.
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming thin film
- Patent number 7,105,459
- Issue date Sep 12, 2006
- Rohm Co., Ltd.
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and production method therefor
- Patent number 7,075,170
- Issue date Jul 11, 2006
- Rohm Co., Ltd.
- Yoshiaki Oku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mesoporous silica, mesoporous silica composite material, and proces...
- Patent number 6,949,293
- Issue date Sep 27, 2005
- NGK Insulators, Ltd.
- Norikazu Nishiyama
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20070164437
- Publication date Jul 19, 2007
- ROHM CO., LTD.
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, and method for manufacturing the same
- Publication number 20060186559
- Publication date Aug 24, 2006
- ROHM CO., LTD.
- Yoshiaki Oku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mesoporous silica, mesoporous silica composite material, and proces...
- Publication number 20050232841
- Publication date Oct 20, 2005
- NGK Insulators, Ltd.
- Norikazu Nishiyama
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method for forming thin film
- Publication number 20050106802
- Publication date May 19, 2005
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Production method for semiconductor device
- Publication number 20050003678
- Publication date Jan 6, 2005
- Norikazu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and production method therefor
- Publication number 20040235288
- Publication date Nov 25, 2004
- Yoshiaki Oku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mesoporous silica, mesoporous silica composite material, and proces...
- Publication number 20020155053
- Publication date Oct 24, 2002
- NGK Insulators, Ltd.
- Norikazu Nishiyama
- C01 - INORGANIC CHEMISTRY

Korekazu Ueyama

Person

Patents Grantslast 30 patents

Semiconductor device, and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Production method for semiconductor device

Method for forming thin film

Semiconductor device and production method therefor

Mesoporous silica, mesoporous silica composite material, and proces...

Patents Applicationslast 30 patents

Semiconductor device and method of manufacturing the same

Semiconductor device, and method for manufacturing the same

Mesoporous silica, mesoporous silica composite material, and proces...

Method for forming thin film

Production method for semiconductor device

Semiconductor device and production method therefor

Mesoporous silica, mesoporous silica composite material, and proces...