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Koshi ONISHI
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,829,068
Issue date
Nov 28, 2023
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,703,756
Issue date
Jul 18, 2023
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
Patent number
11,275,307
Issue date
Mar 15, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi Arai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,181,822
Issue date
Nov 23, 2021
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
Patent number
10,908,502
Issue date
Feb 2, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi Arai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method of preparing polymer compound
Patent number
10,414,918
Issue date
Sep 17, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka Komuro
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method for forming resist pattern, and polymer...
Patent number
10,295,905
Issue date
May 21, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka Komuro
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240248403
Publication date
Jul 25, 2024
Tokyo Ohka Kogyo Co., Ltd.
Tetsuya Matsushita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121116
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220121118
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220121117
Publication date
Apr 21, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220011666
Publication date
Jan 13, 2022
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200088
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Toshiaki YATSUNAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20210055656
Publication date
Feb 25, 2021
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190384174
Publication date
Dec 19, 2019
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi ARAI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20190384175
Publication date
Dec 19, 2019
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi ARAI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190361343
Publication date
Nov 28, 2019
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20190107779
Publication date
Apr 11, 2019
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi ARAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...
Publication number
20180024433
Publication date
Jan 25, 2018
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka KOMURO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PREPARING POLYMER COMPOUND
Publication number
20180022916
Publication date
Jan 25, 2018
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka KOMURO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...