Kosuke IGATA

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Toyama-shi, JP

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Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BAS...
- Publication number 20240184204
- Publication date Jun 6, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY