Kosuke Takai

Person

Yokohama Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device, template, and method of manufacturing template
- Patent number 12,068,244
- Issue date Aug 20, 2024
- Kioxia Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, manufacturing method of template
- Patent number 11,796,910
- Issue date Oct 24, 2023
- Kioxia Corporation
- Kosuke Takai
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,776,823
- Issue date Oct 3, 2023
- Kioxia Corporation
- Mana Tanabe
- B08 - CLEANING
Information Patent Grant
Processing apparatus for processing substrates of different types
- Patent number 11,682,566
- Issue date Jun 20, 2023
- Kioxia Corporation
- Kosuke Takai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection method and photomask fabrication method
- Patent number 11,579,537
- Issue date Feb 14, 2023
- Kioxia Corporation
- Keiko Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,443,963
- Issue date Sep 13, 2022
- Kioxia Corporation
- Mana Tanabe
- B08 - CLEANING
Information Patent Grant
Method for producing photomask, method for producing semiconductor...
- Patent number 11,275,305
- Issue date Mar 15, 2022
- Kioxia Corporation
- Yukio Oppata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and manufacturing method of same
- Patent number 11,249,391
- Issue date Feb 15, 2022
- Kioxia Corporation
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, substrate processing apparatus, and co...
- Patent number 11,185,895
- Issue date Nov 30, 2021
- TOSHIBA MEMORY CORPORATION
- Mana Tanabe
- B08 - CLEANING
Information Patent Grant
Substrate processing method, substrate processing apparatus, and co...
- Patent number 11,123,774
- Issue date Sep 21, 2021
- TOSHIBA MEMORY CORPORATION
- Kosuke Takai
- B08 - CLEANING
Information Patent Grant
Reflection-type exposure mask
- Patent number 10,698,311
- Issue date Jun 30, 2020
- TOSHIBA MEMORY CORPORATION
- Takeshi Yamane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask and method for manufacturing same
- Patent number 10,018,904
- Issue date Jul 10, 2018
- TOSHIBA MEMORY CORPORATION
- Kosuke Takai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask production method and lithography mask production...
- Patent number 10,012,896
- Issue date Jul 3, 2018
- TOSHIBA MEMORY CORPORATION
- Kosuke Takai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light reflection type lithography mask, its manufacturing method, m...
- Patent number 9,946,150
- Issue date Apr 17, 2018
- TOSHIBA MEMORY CORPORATION
- Kosuke Takai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask manufacturing method and photomask
- Patent number 9,846,357
- Issue date Dec 19, 2017
- TOSHIBA MEMORY CORPORATION
- Kosuke Takai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 9,507,251
- Issue date Nov 29, 2016
- Shibaura Mechatronics Corporation
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-reflective photomask and mask blank for EUV exposure, and man...
- Patent number 9,280,044
- Issue date Mar 8, 2016
- Kabushiki Kaisha Toshiba
- Kosuke Takai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 8,702,901
- Issue date Apr 22, 2014
- Shibaura Mechatronics Corporation
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light reflecting mask, exposure apparatus, and measuring method
- Patent number 8,007,960
- Issue date Aug 30, 2011
- Kabushiki Kaisha Toshiba
- Kosuke Takai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection-type mask and method of making the reflection-type mask
- Patent number 7,932,002
- Issue date Apr 26, 2011
- Kabushiki Kaisha Toshiba
- Kosuke Takai
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK
- Publication number 20240427228
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240096653
- Publication date Mar 21, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240096652
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Mana TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, COMBINED PROCESSING APPARATUS, AND RECORDIN...
- Publication number 20230089980
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Noriko SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230019111
- Publication date Jan 19, 2023
- KIOXIA Corporation
- Kosuke TAKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220384218
- Publication date Dec 1, 2022
- KIOXIA Corporation
- Mana TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE, MANUFACTURING METHOD OF TEMPLATE
- Publication number 20220299870
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE, TEMPLATE, AND METHOD OF MANUFACTURING TEMPLATE
- Publication number 20220302024
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Yasuhito YOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORIGINAL PLATE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220082933
- Publication date Mar 17, 2022
- KIOXIA Corporation
- Kaori UMEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING TEMPLATE, TEMPLATE, AND METHOD OF MANUFACTU...
- Publication number 20210302830
- Publication date Sep 30, 2021
- KIOXIA Corporation
- Kosuke TAKAI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PATTERN INSPECTION METHOD AND PHOTOMASK FABRICATION METHOD
- Publication number 20210294225
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Keiko MORISHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20210242042
- Publication date Aug 5, 2021
- Toshiba Memory Corporation
- Kosuke TAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING PHOTOMASK, METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20210048739
- Publication date Feb 18, 2021
- KIOXIA Corporation
- Yukio OPPATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200294822
- Publication date Sep 17, 2020
- Toshiba Memory Corporation
- Mana TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200147655
- Publication date May 14, 2020
- Toshiba Memory Corporation
- Kosuke TAKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...
- Publication number 20200078833
- Publication date Mar 12, 2020
- Toshiba Memory Corporation
- Kosuke TAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...
- Publication number 20200078834
- Publication date Mar 12, 2020
- Toshiba Memory Corporation
- Mana TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS
- Publication number 20190221452
- Publication date Jul 18, 2019
- Toshiba Memory Corporation
- Kosuke TAKAI
- B08 - CLEANING
Information Patent Application
EXPOSURE MASK AND MANUFACTURING METHOD OF SAME
- Publication number 20190086792
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Takashi KAMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE EXPOSURE MASK
- Publication number 20180275506
- Publication date Sep 27, 2018
- Toshiba Memory Corporation
- Takeshi YAMANE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MASK PRODUCTION METHOD AND LITHOGRAPHY MASK PRODUCTION...
- Publication number 20170269469
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE
- Publication number 20170074802
- Publication date Mar 16, 2017
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G01 - MEASURING TESTING
Information Patent Application
EUV MASK AND METHOD FOR MANUFACTURING SAME
- Publication number 20170038671
- Publication date Feb 9, 2017
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT REFLECTION TYPE LITHOGRAPHY MASK, ITS MANUFACTURING METHOD, M...
- Publication number 20160274453
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Photomask, Method for Inspecting Same and Mask Blank
- Publication number 20160266058
- Publication date Sep 15, 2016
- Kabushiki Kaisha Toshiba
- Masato NAKA
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK MANUFACTURING METHOD AND PHOTOMASK
- Publication number 20150261081
- Publication date Sep 17, 2015
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT-REFLECTIVE PHOTOMASK AND MASK BLANK FOR EUV EXPOSURE, AND MAN...
- Publication number 20140242499
- Publication date Aug 28, 2014
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20140186754
- Publication date Jul 3, 2014
- Kabushiki Kaisha Toshiba
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20120129083
- Publication date May 24, 2012
- Kabushiki Kaisha Toshiba
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT REFLECTING MASK, EXPOSURE APPARATUS, AND MEASURING METHOD
- Publication number 20110286002
- Publication date Nov 24, 2011
- Kabushiki Kaisha Toshiba
- Kosuke TAKAI
- G02 - OPTICS

Kosuke Takai

Person

Patents Grantslast 30 patents

Semiconductor device, template, and method of manufacturing template

Template, manufacturing method of template

Substrate processing method and substrate processing apparatus

Processing apparatus for processing substrates of different types

Pattern inspection method and photomask fabrication method

Substrate processing method and substrate processing apparatus

Method for producing photomask, method for producing semiconductor...

Exposure mask and manufacturing method of same

Substrate processing method, substrate processing apparatus, and co...

Substrate processing method, substrate processing apparatus, and co...

Reflection-type exposure mask

EUV mask and method for manufacturing same

Lithography mask production method and lithography mask production...

Light reflection type lithography mask, its manufacturing method, m...

Photomask manufacturing method and photomask

Method for manufacturing reflective mask and apparatus for manufact...

Light-reflective photomask and mask blank for EUV exposure, and man...

Method for manufacturing reflective mask and apparatus for manufact...

Light reflecting mask, exposure apparatus, and measuring method

Reflection-type mask and method of making the reflection-type mask

Patents Applicationslast 30 patents

PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK

SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

PATTERN FORMING METHOD, COMBINED PROCESSING APPARATUS, AND RECORDIN...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

TEMPLATE, MANUFACTURING METHOD OF TEMPLATE

SEMICONDUCTOR DEVICE, TEMPLATE, AND METHOD OF MANUFACTURING TEMPLATE

ORIGINAL PLATE AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING TEMPLATE, TEMPLATE, AND METHOD OF MANUFACTU...

PATTERN INSPECTION METHOD AND PHOTOMASK FABRICATION METHOD

PROCESSING APPARATUS

METHOD FOR PRODUCING PHOTOMASK, METHOD FOR PRODUCING SEMICONDUCTOR...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...

PROCESSING APPARATUS

EXPOSURE MASK AND MANUFACTURING METHOD OF SAME

REFLECTION-TYPE EXPOSURE MASK

LITHOGRAPHY MASK PRODUCTION METHOD AND LITHOGRAPHY MASK PRODUCTION...

DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE

EUV MASK AND METHOD FOR MANUFACTURING SAME

LIGHT REFLECTION TYPE LITHOGRAPHY MASK, ITS MANUFACTURING METHOD, M...

Reflective Photomask, Method for Inspecting Same and Mask Blank

PHOTOMASK MANUFACTURING METHOD AND PHOTOMASK

LIGHT-REFLECTIVE PHOTOMASK AND MASK BLANK FOR EUV EXPOSURE, AND MAN...

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...

LIGHT REFLECTING MASK, EXPOSURE APPARATUS, AND MEASURING METHOD