Kota Atsuchi

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,972,762
- Issue date Jul 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing positive resist composition, positive resist co...
- Patent number 7,879,527
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing photoresist composition, filter, coater and p...
- Patent number 7,771,911
- Issue date Aug 10, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Copolymer for semiconductor lithography and process for production...
- Patent number 7,695,889
- Issue date Apr 13, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for refining crude resin for electronic material
- Patent number 7,312,015
- Issue date Dec 25, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for refining crude resin for resist
- Patent number 7,276,575
- Issue date Oct 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090233220
- Publication date Sep 17, 2009
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING POSITIVE RESIST COMPOSITION, POSITIVE RESIST CO...
- Publication number 20090092924
- Publication date Apr 9, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer for semiconductor lithography and process for production...
- Publication number 20060257784
- Publication date Nov 16, 2006
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for refining crude resin for electronic material
- Publication number 20060141384
- Publication date Jun 29, 2006
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for refining crude resin for resist
- Publication number 20060135745
- Publication date Jun 22, 2006
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for producing photoresist composition, filter, coater and p...
- Publication number 20060014098
- Publication date Jan 19, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Kota Atsuchi

Person

Patents Grantslast 30 patents

Positive resist composition and method of forming resist pattern

Method of producing positive resist composition, positive resist co...

Process for producing photoresist composition, filter, coater and p...

Copolymer for semiconductor lithography and process for production...

Process for refining crude resin for electronic material

Process for refining crude resin for resist

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF PRODUCING POSITIVE RESIST COMPOSITION, POSITIVE RESIST CO...

Copolymer for semiconductor lithography and process for production...

Process for refining crude resin for electronic material

Process for refining crude resin for resist

Process for producing photoresist composition, filter, coater and p...