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Kota Nishino
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Tokyo, JP
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last 30 patents
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Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
9,703,195
Issue date
Jul 11, 2017
JSR Corporation
Hayato Namai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and compound
Patent number
8,968,980
Issue date
Mar 3, 2015
JSR Corporation
Ken Maruyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition and polymer
Patent number
8,470,513
Issue date
Jun 25, 2013
JSR Corporation
Kota Nishino
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Patents Applications
last 30 patents
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Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20150323866
Publication date
Nov 12, 2015
JSR Corporation
Hayato NAMAI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
Publication number
20120058429
Publication date
Mar 8, 2012
JSR Corporation
Kota Nishino
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
Publication number
20120045719
Publication date
Feb 23, 2012
JSR Corporation
Ken Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...