Kotaro ENDO

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,921,711
- Issue date Feb 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi Fujisaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,627,717
- Issue date Apr 21, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,180,625
- Issue date Jan 15, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and polymeric...
- Patent number 9,890,233
- Issue date Feb 13, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Miki Shinomiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 9,851,637
- Issue date Dec 26, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, acid generato...
- Patent number 9,682,951
- Issue date Jun 20, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern
- Patent number 9,494,860
- Issue date Nov 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern
- Patent number 9,244,357
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yuta Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,795,947
- Issue date Aug 5, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,487,056
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,338,076
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 8,329,838
- Issue date Dec 11, 2012
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming resist protection films and method for resist...
- Patent number 8,278,025
- Issue date Oct 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,236,477
- Issue date Aug 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound, acid generator, resist composition, and method of forming...
- Patent number 8,227,169
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,206,891
- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for forming resist protective film and method for forming...
- Patent number 7,951,523
- Issue date May 31, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for formation of resist protection film and method of form...
- Patent number 7,879,529
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming resist protective film for use in liquid immer...
- Patent number 7,846,637
- Issue date Dec 7, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion lithography and method fo...
- Patent number 7,799,507
- Issue date Sep 21, 2010
- Tokyo Ohka Co., Ltd.
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 7,799,883
- Issue date Sep 21, 2010
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and resist pattern formation method by the...
- Patent number 7,700,257
- Issue date Apr 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition, and low-molecular compound and high-molecu...
- Patent number 7,592,122
- Issue date Sep 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, resist composition and dissolution inhibitor agen...
- Patent number 7,326,512
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for liquid immersion exposure process and method...
- Patent number 7,264,918
- Issue date Sep 4, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,846,949
- Issue date Jan 25, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,683,202
- Issue date Jan 27, 2004
- Tokyo Ohka, Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20200209741
- Publication date Jul 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284611
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masafumi FUJISAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180284612
- Publication date Oct 4, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20170293223
- Publication date Oct 12, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...
- Publication number 20170176855
- Publication date Jun 22, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20170097564
- Publication date Apr 6, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATO...
- Publication number 20160280679
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20150198880
- Publication date Jul 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Miki Shinomiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20140205956
- Publication date Jul 24, 2014
- Tokyo Ohka Kogyo Co., Ltd
- Yuta Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130252171
- Publication date Sep 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130065180
- Publication date Mar 14, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120328982
- Publication date Dec 27, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yuta Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120329969
- Publication date Dec 27, 2012
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120308931
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN
- Publication number 20120164578
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...
- Publication number 20110065878
- Publication date Mar 17, 2011
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and method of forming resist pattern
- Publication number 20100183981
- Publication date Jul 22, 2010
- Tasuku Matsumiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition, method of forming resist pattern, novel compoun...
- Publication number 20100136478
- Publication date Jun 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...
- Publication number 20100124720
- Publication date May 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...
- Publication number 20100104973
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100086873
- Publication date Apr 8, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...
- Publication number 20090280431
- Publication date Nov 12, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING...
- Publication number 20090197199
- Publication date Aug 6, 2009
- Tokyo Ohka Kogyo Co., LTD.
- Keita Ishizuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...
- Publication number 20090117490
- Publication date May 7, 2009
- Tokyo OhkaKogyo Co., Ltd.
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST...
- Publication number 20090053646
- Publication date Feb 26, 2009
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACRYLIC COPOLYMER
- Publication number 20090048409
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHO...
- Publication number 20090011375
- Publication date Jan 8, 2009
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for Formation of Resist Protection Film and Method of Form...
- Publication number 20080311523
- Publication date Dec 18, 2008
- Kotaro Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for Forming Resist Protection Films and Method for Resist...
- Publication number 20080299503
- Publication date Dec 4, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Material for Forming Resist Protective Film for Use in Liquid Immer...
- Publication number 20080032202
- Publication date Feb 7, 2008
- Keita Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kotaro ENDO

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition, method of forming resist pattern, and polymeric...

Resist composition, method of forming resist pattern, compound, and...

Resist composition, method of forming resist pattern, acid generato...

Resist composition, method of forming resist pattern

Method for forming resist pattern

Resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, novel compoun...

Norbornene-type polymers, compositions thereof and lithographic pro...

Material for forming resist protection films and method for resist...

Positive resist composition and method of forming resist pattern

Compound, acid generator, resist composition, and method of forming...

Positive resist composition and method of forming resist pattern

Material for forming resist protective film and method for forming...

Material for formation of resist protection film and method of form...

Material for forming resist protective film for use in liquid immer...

Positive resist composition for immersion lithography and method fo...

Norbornene-type polymers, compositions thereof and lithographic pro...

Photoresist composition and resist pattern formation method by the...

Photoresist composition, and low-molecular compound and high-molecu...

Polymer compound, resist composition and dissolution inhibitor agen...

Resist composition for liquid immersion exposure process and method...

Fluorine-containing monomeric ester compound for base resin in phot...

Fluorine-containing monomeric ester compound for base resin in phot...

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERAT...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATO...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN

Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, novel compoun...

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...

COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...

MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING...

POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FO...

MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST...

ACRYLIC COPOLYMER

IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHO...

Material for Formation of Resist Protection Film and Method of Form...

Material for Forming Resist Protection Films and Method for Resist...

Material for Forming Resist Protective Film for Use in Liquid Immer...