Kotaro Tsurusaki

Person

Saga-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,183,613
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,978,644
- Issue date May 7, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and processing liquid concentration...
- Patent number 11,615,971
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Teruaki Konishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,476,130
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,469,114
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,404,294
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazuya Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid treatment method and storage system
- Patent number 8,652,344
- Issue date Feb 18, 2014
- Tokyo Electron Limited
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, substrate processing method, recording...
- Patent number 7,836,900
- Issue date Nov 23, 2010
- Tokyo Electron Limited
- Takayuki Toshima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate drying processing apparatus, method, and program recordin...
- Patent number 7,581,335
- Issue date Sep 1, 2009
- Tokyo Electron Limited
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Washing/drying process apparatus and washing/drying process method
- Patent number 6,247,479
- Issue date Jun 19, 2001
- Tokyo Electron Limited
- Hiroki Taniyama
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240242975
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20220392779
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220105535
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Kotaro TSURUSAKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111038
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111054
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200286754
- Publication date Sep 10, 2020
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200286751
- Publication date Sep 10, 2020
- TOKYO ELECTRON LIMITED
- Kazuya Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID CONCENTRATION...
- Publication number 20200194280
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Teruaki KONISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING...
- Publication number 20110011425
- Publication date Jan 20, 2011
- TOKYO ELECTRON LIMITED
- Takayuki TOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT METHOD AND STORAGE SYSTEM
- Publication number 20090179007
- Publication date Jul 16, 2009
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing system, substrate processing method, recording...
- Publication number 20070175062
- Publication date Aug 2, 2007
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Drying apparatus, drying method, substrate processing apparatus, su...
- Publication number 20070113423
- Publication date May 24, 2007
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid treatment device and liquid treatment method
- Publication number 20060060232
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS

Kotaro Tsurusaki

Person

Patents Grantslast 30 patents

Substrate processing system and substrate processing method

Substrate processing system and substrate processing method

Substrate processing apparatus and processing liquid concentration...

Substrate processing apparatus, substrate processing method, and st...

Substrate processing system and substrate processing method

Substrate processing apparatus, substrate processing method, and st...

Liquid treatment method and storage system

Substrate processing system, substrate processing method, recording...

Substrate drying processing apparatus, method, and program recordin...

Washing/drying process apparatus and washing/drying process method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID CONCENTRATION...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING...

LIQUID TREATMENT METHOD AND STORAGE SYSTEM

Substrate processing system, substrate processing method, recording...

Drying apparatus, drying method, substrate processing apparatus, su...

Liquid treatment device and liquid treatment method