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Kou Hasegawa
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Polishing pad and production method thereof
Patent number
7,922,783
Issue date
Apr 12, 2011
JSR Corporation
Fujio Sakurai
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad for semiconductor wafer, polishing multilayered body...
Patent number
7,323,415
Issue date
Jan 29, 2008
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing body
Patent number
7,217,305
Issue date
May 15, 2007
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing body
Patent number
7,201,641
Issue date
Apr 10, 2007
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pad and chemical mechanical polishing...
Patent number
7,183,213
Issue date
Feb 27, 2007
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing pad
Patent number
7,097,550
Issue date
Aug 29, 2006
JSR Corporation
Kouji Kawahara
B24 - GRINDING POLISHING
Information
Patent Grant
Composition for polishing pad and polishing pad using the same
Patent number
7,077,879
Issue date
Jul 18, 2006
JSR Corporation
Toshihiro Ogawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Abrasive material
Patent number
7,001,252
Issue date
Feb 21, 2006
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad
Patent number
6,992,123
Issue date
Jan 31, 2006
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad
Patent number
6,976,910
Issue date
Dec 20, 2005
JSR Corporation
Yukio Hosaka
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad for semiconductor wafer and laminated body for polish...
Patent number
6,855,034
Issue date
Feb 15, 2005
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad for semiconductor wafer and polishing process using t...
Patent number
6,848,974
Issue date
Feb 1, 2005
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Window member for chemical mechanical polishing and polishing pad
Patent number
6,832,949
Issue date
Dec 21, 2004
JSR Corporation
Tomohisa Konno
B24 - GRINDING POLISHING
Information
Patent Grant
Composition for polishing pad and polishing pad using the same
Patent number
6,790,883
Issue date
Sep 14, 2004
JSR Corporation
Toshihiro Ogawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polishing method
Patent number
6,777,335
Issue date
Aug 17, 2004
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Composition for forming polishing pad, crosslinked body for polishi...
Patent number
6,645,264
Issue date
Nov 11, 2003
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Grant
Thermoplastic elastomer composition
Patent number
6,153,704
Issue date
Nov 28, 2000
JSR Corporation
Kazuhisa Kodama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
POLISHING PAD AND PRODUCTION METHOD THEREOF
Publication number
20080313967
Publication date
Dec 25, 2008
JSR Corporation
Fujio Sakurai
B24 - GRINDING POLISHING
Information
Patent Application
Polishing body
Publication number
20060116054
Publication date
Jun 1, 2006
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Polishing body
Publication number
20060075686
Publication date
Apr 13, 2006
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Chemical mechanical polishing pad
Publication number
20050260942
Publication date
Nov 24, 2005
JSR Corporation
Kouji Kawahara
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad and method of manufacturing semiconductor devices
Publication number
20050227489
Publication date
Oct 13, 2005
Gaku Minamihara
B24 - GRINDING POLISHING
Information
Patent Application
Chemical mechanical polishing pad, production method thereof, and c...
Publication number
20050222336
Publication date
Oct 6, 2005
JSR Corporation
Takahiro Okamoto
B24 - GRINDING POLISHING
Information
Patent Application
Chemical mechanical polishing pad and chemical mechanical polishing...
Publication number
20050014376
Publication date
Jan 20, 2005
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad
Publication number
20050003749
Publication date
Jan 6, 2005
JSR Corporation
Yukio Hosaka
B24 - GRINDING POLISHING
Information
Patent Application
Method of machining semiconductor wafer-use polishing pad and semic...
Publication number
20040266326
Publication date
Dec 30, 2004
Hiroshi Shiho
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Composition for polishing pad and polishing pad using the same
Publication number
20040244299
Publication date
Dec 9, 2004
JSR Corporation
Toshihiro Ogawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polishing pad and method of polishing a semiconductor wafer
Publication number
20040224611
Publication date
Nov 11, 2004
JSR Corporation
Hiromi Aoi
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad and production method thereof
Publication number
20040224622
Publication date
Nov 11, 2004
JSR Corporation
Fujio Sakurai
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad and chemical mechanical polishing method
Publication number
20040224616
Publication date
Nov 11, 2004
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Application
Abrasive pad, method and metal mold for manufacturing the same, and...
Publication number
20040203320
Publication date
Oct 14, 2004
JSR Corporation
Yukio Hosaka
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad
Publication number
20040118051
Publication date
Jun 24, 2004
JSR Corporation
Hiroshi Shiho
B24 - GRINDING POLISHING
Information
Patent Application
Composition for polishing pad and polishing pad therewith
Publication number
20040063391
Publication date
Apr 1, 2004
JSR Corporation
Yukio Hosaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polishing pad and multi-layer polishing pad
Publication number
20040014413
Publication date
Jan 22, 2004
JSR Corporation
Nobuo Kawahashi
B24 - GRINDING POLISHING
Information
Patent Application
Abrasive material
Publication number
20030153255
Publication date
Aug 14, 2003
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Window member for chemical mechanical polishing and polishing pad
Publication number
20030129931
Publication date
Jul 10, 2003
JSR Corporation
Tomohisa Konno
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad for semiconductor wafer and polishing process using t...
Publication number
20030060138
Publication date
Mar 27, 2003
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Polishing pad for semiconductor wafer and laminated body for polish...
Publication number
20020173231
Publication date
Nov 21, 2002
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Polishing method
Publication number
20020098701
Publication date
Jul 25, 2002
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Composition for forming polishing pad, crosslinked body for polishi...
Publication number
20020078632
Publication date
Jun 27, 2002
JSR Corporation
Kou Hasegawa
B24 - GRINDING POLISHING
Information
Patent Application
Composition for polishing pad and polishing pad using the same
Publication number
20020010232
Publication date
Jan 24, 2002
JSR Corporation
Toshihiro Ogawa
B24 - GRINDING POLISHING