Kouhei Sasamoto

Person

Niigata, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank, and manufacturing method thereof
- Patent number 11,774,845
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method of manufacturing photomask, and photomask
- Patent number 11,143,949
- Issue date Oct 12, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, and method of manufacturing photomask
- Patent number 11,131,920
- Issue date Sep 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,989,999
- Issue date Apr 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for producing photomask
- Patent number 10,788,747
- Issue date Sep 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing photomask blank, photomask blank, method for p...
- Patent number 10,782,608
- Issue date Sep 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,466,583
- Issue date Nov 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,372,030
- Issue date Aug 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 10,040,220
- Issue date Aug 7, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 9,880,459
- Issue date Jan 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,864,266
- Issue date Jan 9, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,864,269
- Issue date Jan 9, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inorganic material film, photomask blank, and method for manufactur...
- Patent number 9,851,633
- Issue date Dec 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,798,230
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designing of photomask blank and photomask blank
- Patent number 9,798,229
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,541,823
- Issue date Jan 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 9,440,375
- Issue date Sep 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Halftone phase shift photomask blank, halftone phase shift photomas...
- Patent number 9,366,951
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,268,212
- Issue date Feb 23, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and method for...
- Patent number 9,188,852
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Half-tone phase shift mask blank and method for manufacturing half-...
- Patent number 9,158,192
- Issue date Oct 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, AND MANUFACTURING METHOD THEREOF
- Publication number 20210405520
- Publication date Dec 30, 2021
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF PHOTOMASK, AND PHOTOMASK BLANK
- Publication number 20210407803
- Publication date Dec 30, 2021
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20200192215
- Publication date Jun 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20200026181
- Publication date Jan 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD OF MANUFACTURING PHOTOMASK, AND PHOTOMASK
- Publication number 20190369482
- Publication date Dec 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK
- Publication number 20190146329
- Publication date May 16, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PHOTOMASK BLANK, PHOTOMASK BLANK, METHOD FOR P...
- Publication number 20180224737
- Publication date Aug 9, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20180088457
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20170068154
- Publication date Mar 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20170068156
- Publication date Mar 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20170031237
- Publication date Feb 2, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...
- Publication number 20170003584
- Publication date Jan 5, 2017
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20160346960
- Publication date Dec 1, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20160291452
- Publication date Oct 6, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20160077425
- Publication date Mar 17, 2016
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK
- Publication number 20160033859
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...
- Publication number 20150159264
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK
- Publication number 20150160549
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, HALFTONE PHASE SHIFT PHOTOMAS...
- Publication number 20150125785
- Publication date May 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD
- Publication number 20130306596
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20130309600
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...
- Publication number 20130309598
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...
- Publication number 20130309601
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kouhei Sasamoto

Person

Patents Grantslast 30 patents

Photomask blank, and manufacturing method thereof

Photomask blank, method of manufacturing photomask, and photomask

Photomask blank, and method of manufacturing photomask

Halftone phase shift mask blank and halftone phase shift mask

Photomask blank and method for producing photomask

Method for preparing photomask blank, photomask blank, method for p...

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift mask blank and halftone phase shift mask

Blank for mold production and method for manufacturing mold

Photomask blank and method for preparing photomask

Photomask blank

Photomask blank

Inorganic material film, photomask blank, and method for manufactur...

Photomask blank

Designing of photomask blank and photomask blank

Photomask blank

Blank for mold production and method for manufacturing mold

Halftone phase shift photomask blank, halftone phase shift photomas...

Photomask blank and method for manufacturing photomask

Photomask blank, method for manufacturing photomask, and method for...

Half-tone phase shift mask blank and method for manufacturing half-...

Patents Applicationslast 30 patents

PHOTOMASK BLANK, AND MANUFACTURING METHOD THEREOF

MANUFACTURING METHOD OF PHOTOMASK, AND PHOTOMASK BLANK

PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

PHOTOMASK BLANK, METHOD OF MANUFACTURING PHOTOMASK, AND PHOTOMASK

PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK

METHOD FOR PREPARING PHOTOMASK BLANK, PHOTOMASK BLANK, METHOD FOR P...

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

PHOTOMASK BLANK

PHOTOMASK BLANK

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

INORGANIC MATERIAL FILM, PHOTOMASK BLANK, AND METHOD FOR MANUFACTUR...

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

PHOTOMASK BLANK

DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK

SPUTTER DEPOSITION METHOD, SPUTTERING SYSTEM, MANUFACTURE OF PHOTOM...

PHOTOMASK BLANK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, HALFTONE PHASE SHIFT PHOTOMAS...

BLANK FOR MOLD PRODUCTION AND METHOD FOR MANUFACTURING MOLD

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...