Kouichi Abe

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for manufacturing patterne...
- Patent number 10,175,577
- Issue date Jan 8, 2019
- Hitachi Chemical Company, Ltd.
- Shingo Tahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, method of forming silica-based coa...
- Patent number 8,158,981
- Issue date Apr 17, 2012
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...
- Publication number 20150024173
- Publication date Jan 22, 2015
- HITACHI CHEMICAL CO., Ltd.
- Shingo Tahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING...
- Publication number 20120021190
- Publication date Jan 26, 2012
- Yousuke Aoki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COA...
- Publication number 20100102321
- Publication date Apr 29, 2010
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming Antireflection Film
- Publication number 20090214796
- Publication date Aug 27, 2009
- Kaoru Okaniwa
- G02 - OPTICS