Kouichi Fujiwara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,348,226
- Issue date May 24, 2016
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition for making resist pattern insoluble, and method f...
- Patent number 9,029,067
- Issue date May 12, 2015
- JSR Corporation
- Gouji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition for making resist pattern insoluble, and method f...
- Patent number 8,877,429
- Issue date Nov 4, 2014
- JSR Corporation
- Gouji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type radiation-sensitive composition, and resist pattern f...
- Patent number 8,501,385
- Issue date Aug 6, 2013
- JSR Corporation
- Yusuke Anno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acrylic polymer and radiation-sensitive resin composition
- Patent number 7,704,669
- Issue date Apr 27, 2010
- JSR Corporation
- Kouichi Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acrylic copolymer and radiation-sensitive resin composition
- Patent number 7,452,655
- Issue date Nov 18, 2008
- JSR Corporation
- Hiroyuki Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
- Publication number 20150004547
- Publication date Jan 1, 2015
- JSR Corporation
- Gouji WAKAMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
- Publication number 20110123936
- Publication date May 26, 2011
- JSR Corporation
- Masafumi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
- Publication number 20110111349
- Publication date May 12, 2011
- JSR Corporation
- Gouji WAKAMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...
- Publication number 20110104612
- Publication date May 5, 2011
- JSR Corporation
- Yusuke ANNO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Acrylic Polymer and Radiation-Sensitive Resin Composition
- Publication number 20070269754
- Publication date Nov 22, 2007
- Kouichi Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234154
- Publication date Oct 19, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acrylic copolymer and radiation-sensitive resin composition
- Publication number 20060074139
- Publication date Apr 6, 2006
- Hiroyuki Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kouichi Fujiwara

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition

Resin composition for making resist pattern insoluble, and method f...

Resin composition for making resist pattern insoluble, and method f...

Positive-type radiation-sensitive composition, and resist pattern f...

Acrylic polymer and radiation-sensitive resin composition

Acrylic copolymer and radiation-sensitive resin composition

Patents Applicationslast 30 patents

RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...

RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD

RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...

POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...

Acrylic Polymer and Radiation-Sensitive Resin Composition

Radiation-sensitive resin composition

Acrylic copolymer and radiation-sensitive resin composition