Kouichi Katou

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polymide precursor resin composition
- Patent number 6,664,021
- Issue date Dec 16, 2003
- Chisso Corporation
- Hirotoshi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polyimide resin composition
- Patent number 5,589,319
- Issue date Dec 31, 1996
- Chisso Corporation
- Kouichi Katou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polyimide precursor composition with photoacid gener...
- Patent number 5,449,588
- Issue date Sep 12, 1995
- Chisso Corporation
- Hirotoshi Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing polyamic acid derivative and photosensitive resi...
- Patent number 5,449,705
- Issue date Sep 12, 1995
- Chisso Corporation
- Eiji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polyimide precursor composition
- Patent number 5,442,024
- Issue date Aug 15, 1995
- Chisso Corporation
- Kouichi Kunimune
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of preparing a negative pattern utilizing photosensitive pol...
- Patent number 5,342,739
- Issue date Aug 30, 1994
- Chisso Corporation
- Kouichi Katou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kouichi Katou

Person

Patents Grantslast 30 patents

Photosensitive polymide precursor resin composition

Photosensitive polyimide resin composition

Photosensitive polyimide precursor composition with photoacid gener...

Silicon-containing polyamic acid derivative and photosensitive resi...

Photosensitive polyimide precursor composition

Method of preparing a negative pattern utilizing photosensitive pol...