Kouichi SEKIDO

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Flow rate control method, flow rate control device, and film formin...
- Patent number 11,753,719
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Kennan Mo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate
- Patent number 11,236,425
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Kennan Mo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply method and film forming method
- Patent number 10,870,919
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Katsumasa Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS SUPPLY AMOUNT CALCULATION METHOD AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20230129351
- Publication date Apr 27, 2023
- Tokyo Electron Limited
- Kouichi SEKIDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL SUPPLY APPARATUS AND FILM FORMING APPARATUS
- Publication number 20210324513
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Tomohisa KIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210010130
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW RATE CONTROL METHOD, FLOW RATE CONTROL DEVICE, AND FILM FORMIN...
- Publication number 20190284698
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Kennan MO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, STORAGE MEDIUM, AND RAW MATERIAL GA...
- Publication number 20190177849
- Publication date Jun 13, 2019
- TOKYO ELECTRON LIMITED
- Kennan MO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD
- Publication number 20180251894
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Katsumasa YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kouichi SEKIDO

Person

Patents Grantslast 30 patents

Flow rate control method, flow rate control device, and film formin...

Method of processing substrate

Gas supply method and film forming method

Patents Applicationslast 30 patents

GAS SUPPLY AMOUNT CALCULATION METHOD AND SEMICONDUCTOR DEVICE MANUF...

RAW MATERIAL SUPPLY APPARATUS AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FLOW RATE CONTROL METHOD, FLOW RATE CONTROL DEVICE, AND FILM FORMIN...

METHOD OF PROCESSING SUBSTRATE, STORAGE MEDIUM, AND RAW MATERIAL GA...

GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD