Kouichi Yamamoto

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,632,688
- Issue date Jan 21, 2014
- Hitachi High-Technologies Corporation
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image forming method and charged particle beam apparatus
- Patent number 8,203,504
- Issue date Jun 19, 2012
- Hitachi High-Technologies Corporation
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image forming method and charged particle beam apparatus
- Patent number 7,817,105
- Issue date Oct 19, 2010
- Hitachi High-Technologies Corporation
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam scanning method and charged particle beam app...
- Patent number 7,598,497
- Issue date Oct 6, 2009
- Hitachi High-Technologies Corporation
- Kouichi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image forming method and charged particle beam apparatus
- Patent number 7,187,345
- Issue date Mar 6, 2007
- Hitachi High-Technologies Corporation
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and method of treating substrate using electros...
- Patent number 6,760,213
- Issue date Jul 6, 2004
- Hitachi High-Technologies Corporation
- Kouichi Yamamoto
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130045547
- Publication date Feb 21, 2013
- Masaru IZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120186747
- Publication date Jul 26, 2012
- Shinji OBAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING METALLIZED CERAMIC SUBSTRATE CHIP
- Publication number 20120174390
- Publication date Jul 12, 2012
- Tokuyama Corporation
- Yasuyuki YAMAMOTO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
IMAGE FORMING METHOD AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20110032176
- Publication date Feb 10, 2011
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING METALLIZED CERAMIC SUBSTRATE CHIP
- Publication number 20100065310
- Publication date Mar 18, 2010
- Yasuyuki Yamamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Charged particle beam scanning method and charged particle beam app...
- Publication number 20080054187
- Publication date Mar 6, 2008
- Hitachi High-Technologies Corporation
- Kouichi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Image forming method and charged particle beam apparatus
- Publication number 20070159662
- Publication date Jul 12, 2007
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE FORMING METHOD AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20070024528
- Publication date Feb 1, 2007
- Atsushi Kobaru
- H01 - BASIC ELECTRIC ELEMENTS

Kouichi Yamamoto

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Image forming method and charged particle beam apparatus

Image forming method and charged particle beam apparatus

Charged particle beam scanning method and charged particle beam app...

Image forming method and charged particle beam apparatus

Electrostatic chuck and method of treating substrate using electros...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

METHOD FOR MANUFACTURING METALLIZED CERAMIC SUBSTRATE CHIP

IMAGE FORMING METHOD AND CHARGED PARTICLE BEAM APPARATUS

METHOD FOR MANUFACTURING METALLIZED CERAMIC SUBSTRATE CHIP

Charged particle beam scanning method and charged particle beam app...

Image forming method and charged particle beam apparatus

IMAGE FORMING METHOD AND CHARGED PARTICLE BEAM APPARATUS