Kouichirou Tanaka

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Nozzle unit, liquid treatment apparatus, and liquid treatment method
- Patent number 12,072,625
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Takuya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Development processing apparatus and development processing method
- Patent number 11,923,218
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Kouichirou Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, storage medium, and substrate processi...
- Patent number 11,774,854
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing treatment method, computer storage medium and developing...
- Patent number 11,720,026
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Akiko Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and computer...
- Patent number 11,693,322
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Takuya Miura
- B08 - CLEANING
Information Patent Grant
Substrate processing method, substrate processing apparatus and rec...
- Patent number 11,508,589
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Akiko Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, storage medium, and substrate processi...
- Patent number 11,480,881
- Issue date Oct 25, 2022
- Tokyo Electron Limited
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and recording medium capable of suppres...
- Patent number 11,079,679
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Development method, development device, and non-transitory computer...
- Patent number 10,203,605
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method, substrate processing apparatus, and no...
- Patent number 10,185,220
- Issue date Jan 22, 2019
- Tokyo Electron Limited
- Yusaku Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 10,128,136
- Issue date Nov 13, 2018
- Tokyo Electron Limited
- Masahiro Fukuda
- B08 - CLEANING
Information Patent Grant
Heat processing apparatus of substrate
- Patent number 6,551,448
- Issue date Apr 22, 2003
- Tokyo Electron Limited
- Yasuhiro Kuga
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID TREATMENT METHOD AND STORAGE MEDIUM
- Publication number 20240361687
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Takuya MIURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSI...
- Publication number 20230026275
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSI...
- Publication number 20220035248
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOZZLE UNIT, LIQUID TREATMENT APPARATUS, AND LIQUID TREATMENT METHOD
- Publication number 20210333707
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Takuya MIURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT PROCESSING APPARATUS AND DEVELOPMENT PROCESSING METHOD
- Publication number 20210272826
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kouichirou TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...
- Publication number 20210191271
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Takuya Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND DEVELOPING...
- Publication number 20200064742
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Akiko KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...
- Publication number 20200050111
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND REC...
- Publication number 20190096706
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Akiko Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180157178
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20180047592
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Masahiro Fukuda
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVELOPMENT METHOD, DEVELOPMENT DEVICE, AND NON-TRANSITORY COMPUTER...
- Publication number 20170285481
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND NO...
- Publication number 20170102616
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Heat processing apparatus of substrate
- Publication number 20010053507
- Publication date Dec 20, 2001
- TOKYO ELECTRON LIMITED
- Yasuhiro Kuga
- H01 - BASIC ELECTRIC ELEMENTS

Kouichirou Tanaka

Person

Patents Grantslast 30 patents

Nozzle unit, liquid treatment apparatus, and liquid treatment method

Development processing apparatus and development processing method

Substrate processing method, storage medium, and substrate processi...

Developing treatment method, computer storage medium and developing...

Liquid processing apparatus, liquid processing method, and computer...

Substrate processing method, substrate processing apparatus and rec...

Substrate processing method, storage medium, and substrate processi...

Substrate processing method and recording medium capable of suppres...

Development method, development device, and non-transitory computer...

Substrate processing method, substrate processing apparatus, and no...

Liquid processing apparatus and liquid processing method

Heat processing apparatus of substrate

Patents Applicationslast 30 patents

LIQUID TREATMENT METHOD AND STORAGE MEDIUM

SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSI...

SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSI...

NOZZLE UNIT, LIQUID TREATMENT APPARATUS, AND LIQUID TREATMENT METHOD

DEVELOPMENT PROCESSING APPARATUS AND DEVELOPMENT PROCESSING METHOD

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...

DEVELOPING TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND DEVELOPING...

SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND REC...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

DEVELOPMENT METHOD, DEVELOPMENT DEVICE, AND NON-TRANSITORY COMPUTER...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND NO...

Heat processing apparatus of substrate