Kouji Shimomura

Person

Kofu-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
High-dielectric film substrate processing method
- Patent number 7,858,509
- Issue date Dec 28, 2010
- Tokyo Electron Limited
- Miki Aruga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation method and recording medium
- Patent number 7,754,620
- Issue date Jul 13, 2010
- Tokyo Electron Limited
- Kouji Shimomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing device and method of maintaining the device
- Patent number 7,367,350
- Issue date May 6, 2008
- Tokyo Electron Limited
- Daisuke Toriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MOCVD system
- Patent number 6,319,327
- Issue date Nov 20, 2001
- Tokyo Electron Limited
- Akihiko Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING METHOD, FILM-FORMING APPARATUS, AND OXIDATION METHOD
- Publication number 20220068637
- Publication date Mar 3, 2022
- Tokyo Electron Limited
- Kotaro MIYATANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Processing Apparatus and Microwave Processing Method
- Publication number 20150206778
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Kouji SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING APPARATUS
- Publication number 20150201469
- Publication date Jul 16, 2015
- TOKYO ELECTRON LIMITED
- Kouji SHIMOMURA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150179408
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Kouji Shimomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE HEATING APPARATUS AND PROCESSING METHOD
- Publication number 20150129586
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HEATING APPARATUS AND PROCESSING METHOD
- Publication number 20150090708
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Sumi Tanaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE HEATING APPARATUS AND HEATING METHOD
- Publication number 20140367377
- Publication date Dec 18, 2014
- TOKYO ELECTRON LIMITED
- Taichi MONDEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HEATING APPARATUS
- Publication number 20140291318
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Kouji SHIMOMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE HEAT TREATMENT APPARATUS AND PROCESSING METHOD
- Publication number 20140246424
- Publication date Sep 4, 2014
- TOKYO ELECTRON LIMITED
- Kouji SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING MICROWAVE PROCESSING APPARATUS
- Publication number 20140041682
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Taichi MONDEN
- B08 - CLEANING
Information Patent Application
MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS
- Publication number 20140042153
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Kouji Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING OBJECT
- Publication number 20140038430
- Publication date Feb 6, 2014
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Substrate Treatment, Computer-Readable Recording Medium,...
- Publication number 20080254644
- Publication date Oct 16, 2008
- Tokyo Electron Limited
- Miki Aruga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM
- Publication number 20080242113
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Shintaro AOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of Gate Insulation Film
- Publication number 20080233764
- Publication date Sep 25, 2008
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and recording medium
- Publication number 20060223338
- Publication date Oct 5, 2006
- TOKYO ELECTRON LIMITED
- Kouji Shimomura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing device and method of maintaining the device
- Publication number 20050115501
- Publication date Jun 2, 2005
- Daisuke Toriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Exhaust system for processing apparatus
- Publication number 20030141016
- Publication date Jul 31, 2003
- Wataru Okase
- B08 - CLEANING

Kouji Shimomura

Person

Patents Grantslast 30 patents

High-dielectric film substrate processing method

Film formation method and recording medium

Processing device and method of maintaining the device

MOCVD system

Patents Applicationslast 30 patents

FILM-FORMING METHOD, FILM-FORMING APPARATUS, AND OXIDATION METHOD

Microwave Processing Apparatus and Microwave Processing Method

HEATING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MICROWAVE HEATING APPARATUS AND PROCESSING METHOD

MICROWAVE HEATING APPARATUS AND PROCESSING METHOD

MICROWAVE HEATING APPARATUS AND HEATING METHOD

MICROWAVE HEATING APPARATUS

MICROWAVE HEAT TREATMENT APPARATUS AND PROCESSING METHOD

METHOD FOR CLEANING MICROWAVE PROCESSING APPARATUS

MICROWAVE PROCESSING METHOD AND MICROWAVE PROCESSING APPARATUS

METHOD FOR PROCESSING OBJECT

Method of Substrate Treatment, Computer-Readable Recording Medium,...

FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM

Formation of Gate Insulation Film

Film formation method and recording medium

Processing device and method of maintaining the device

Exhaust system for processing apparatus