Kouji Toishi

Person

Hannan-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,579,497
- Issue date Aug 25, 2009
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,304,175
- Issue date Dec 4, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,132,218
- Issue date Nov 7, 2006
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,129,014
- Issue date Oct 31, 2006
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 6,893,792
- Issue date May 17, 2005
- Sumitomo Chemical Company, Limited
- Yoshiko Miya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Bisazo compounds and process for dyeing or printing using them
- Patent number 6,222,023
- Issue date Apr 24, 2001
- Sumitomo Chemical, Company, Limited
- Kouji Toishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Bisazo compounds and process for dyeing or printing using them
- Patent number 6,214,977
- Issue date Apr 10, 2001
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fiber-reactive bisazo compound
- Patent number 5,998,591
- Issue date Dec 7, 1999
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Monoazo compound and an intermediate for a fiber-reactive dye compound
- Patent number 5,962,655
- Issue date Oct 5, 1999
- Sumitomo Chemical Company, Limited
- Nobutaka Kunimi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bisazo compound and method for dyeing or printing fibrous materials...
- Patent number 5,886,159
- Issue date Mar 23, 1999
- Sumitomo Chemical Company, Limited
- Nobutaka Kunimi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Sulfonate and resist composition
- Publication number 20070088131
- Publication date Apr 19, 2007
- Kouji Toishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070078269
- Publication date Apr 5, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20060194982
- Publication date Aug 31, 2006
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20050214676
- Publication date Sep 29, 2005
- Sumitomo Chemical Company, Limited
- Kouji Toishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20040224251
- Publication date Nov 11, 2004
- Kouji Toishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030236351
- Publication date Dec 25, 2003
- Kouji Toishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition
- Publication number 20030194639
- Publication date Oct 16, 2003
- Yoshiko Miya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20030175620
- Publication date Sep 18, 2003
- Kouji Toishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kouji Toishi

Person

Patents Grantslast 30 patents

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemically amplified positive resist composition

Positive resist composition

Positive resist composition

Bisazo compounds and process for dyeing or printing using them

Bisazo compounds and process for dyeing or printing using them

Fiber-reactive bisazo compound

Monoazo compound and an intermediate for a fiber-reactive dye compound

Bisazo compound and method for dyeing or printing fibrous materials...

Patents Applicationslast 30 patents

Sulfonate and resist composition

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemically amplified positive resist composition

Positive resist composition

Positive resist composition

Positive resist composition

Chemical amplification type positive resist composition