Kouji Yonemura

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and resist pattern formation method
- Patent number 7,364,831
- Issue date Apr 29, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Kouji Yonemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,869,742
- Issue date Mar 22, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Jyunichi Mizuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Positive resist composition and resist pattern formation method
- Publication number 20060014100
- Publication date Jan 19, 2006
- Kouji Yonemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20020182531
- Publication date Dec 5, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Jyunichi Mizuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY