Kouros Ghandehari

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,309,457
- Issue date Nov 13, 2012
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,048,797
- Issue date Nov 1, 2011
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit with contact region and multiple etch stop insul...
- Patent number 7,977,797
- Issue date Jul 12, 2011
- Spansion LLC
- Wenmei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Triple layer anti-reflective hard mask
- Patent number 7,888,269
- Issue date Feb 15, 2011
- Spansion LLC
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor formation method that utilizes multiple etch stop layers
- Patent number 7,572,727
- Issue date Aug 11, 2009
- Spansion LLC
- Wenmei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 7,538,026
- Issue date May 26, 2009
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming narrowly spaced flash memory contact openings and...
- Patent number 7,507,661
- Issue date Mar 24, 2009
- Spansion LLC
- Emmanuil H. Lingunis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor contact and nitride spacer formation system and method
- Patent number 7,361,587
- Issue date Apr 22, 2008
- Spansion, LLC
- Wenmei Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for reducing standing waves in a photoresist
- Patent number 7,070,911
- Issue date Jul 4, 2006
- Advanced Micro Devices, Inc.
- Dawn Hopper
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor manufacturing resolution enhancement system and metho...
- Patent number 6,994,939
- Issue date Feb 7, 2006
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hard mask spacer for sublithographic bitline
- Patent number 6,962,849
- Issue date Nov 8, 2005
- Advanced Micro Devices, Inc.
- Tazrien Kamal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using phase-shifting mask
- Patent number 6,902,851
- Issue date Jun 7, 2005
- Advanced Micro Devices, Inc.
- Carl P. Babcock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for preventing UV radiation damage in a memory...
- Patent number 6,894,342
- Issue date May 17, 2005
- Spansion LLC
- Angela Hui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Narrow bitline using Safier for mirrorbit
- Patent number 6,872,609
- Issue date Mar 29, 2005
- Advanced Micro Devices, Inc.
- Tazrien Kamal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic spin-on anti-reflective coating over inorganic anti-reflect...
- Patent number 6,867,063
- Issue date Mar 15, 2005
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for preventing process-induced UV radiation da...
- Patent number 6,833,581
- Issue date Dec 21, 2004
- Spansion LLC
- Angela Hui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of the CVD bilayer ARC as a hard mask for definition of...
- Patent number 6,818,141
- Issue date Nov 16, 2004
- Advanced Micro Devices, Inc.
- Marina V. Plat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory manufacturing process using disposable ARC for wordline form...
- Patent number 6,720,133
- Issue date Apr 13, 2004
- Advanced Micro Devices, Inc.
- Mark T. Ramsbey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...
- Patent number 6,673,524
- Issue date Jan 6, 2004
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment system for planar charge trapping dielectric memory cell...
- Patent number 6,667,212
- Issue date Dec 23, 2003
- Advanced Micro Devices, Inc.
- Hidehiko Shiraiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for and method of constructing an alternating phase-shifting...
- Patent number 6,664,030
- Issue date Dec 16, 2003
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Flash memory with controlled wordline width
- Patent number 6,653,190
- Issue date Nov 25, 2003
- Advanced Micro Devices, Inc.
- Jean Y. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Attenuated phase shift mask for use in EUV lithography and a method...
- Patent number 6,645,679
- Issue date Nov 11, 2003
- Advanced Micro Devices, Inc.
- Bruno M. La Fontaine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
RELACS shrink method applied for single print resist mask for LDD o...
- Patent number 6,642,148
- Issue date Nov 4, 2003
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory with disposable ARC for wordline formation
- Patent number 6,620,717
- Issue date Sep 16, 2003
- Advanced Micro Devices, Inc.
- Tazrien Kamal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photon assisted deposition of hard mask formation for use in manufa...
- Patent number 6,589,717
- Issue date Jul 8, 2003
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Thinning of trench and line or contact spacing by use of dual layer...
- Patent number 6,528,398
- Issue date Mar 4, 2003
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Binary and attenuating phase-shifting masks for multiple wavelengths
- Patent number 6,500,587
- Issue date Dec 31, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical technique to detect etch process termination
- Patent number 6,501,555
- Issue date Dec 31, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming integrated circuit features by oxidation of titan...
- Patent number 6,475,867
- Issue date Nov 5, 2002
- Advanced Micro Devices, Inc.
- Angela T. Hui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20120045888
- Publication date Feb 23, 2012
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20100009536
- Publication date Jan 14, 2010
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CONTACT FORMATION SYSTEM AND METHOD
- Publication number 20090294969
- Publication date Dec 3, 2009
- Wenmei LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Triple layer anti-reflective hard mask
- Publication number 20070093070
- Publication date Apr 26, 2007
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming narrowly spaced flash memory contact openings and...
- Publication number 20060035459
- Publication date Feb 16, 2006
- Emmanuil H. Lingunis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hard mask removal process
- Publication number 20030087529
- Publication date May 8, 2003
- Yider Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...
- Publication number 20020146648
- Publication date Oct 10, 2002
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- B82 - NANO-TECHNOLOGY

Kouros Ghandehari

Person

Patents Grantslast 30 patents

Multilayer low reflectivity hard mask and process therefor

Multilayer low reflectivity hard mask and process therefor

Integrated circuit with contact region and multiple etch stop insul...

Triple layer anti-reflective hard mask

Semiconductor formation method that utilizes multiple etch stop layers

Multilayer low reflectivity hard mask and process therefor

Method of forming narrowly spaced flash memory contact openings and...

Semiconductor contact and nitride spacer formation system and method

Structure and method for reducing standing waves in a photoresist

Semiconductor manufacturing resolution enhancement system and metho...

Hard mask spacer for sublithographic bitline

Method for using phase-shifting mask

Structure and method for preventing UV radiation damage in a memory...

Narrow bitline using Safier for mirrorbit

Organic spin-on anti-reflective coating over inorganic anti-reflect...

Structure and method for preventing process-induced UV radiation da...

Application of the CVD bilayer ARC as a hard mask for definition of...

Memory manufacturing process using disposable ARC for wordline form...

Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...

Alignment system for planar charge trapping dielectric memory cell...

System for and method of constructing an alternating phase-shifting...

Flash memory with controlled wordline width

Attenuated phase shift mask for use in EUV lithography and a method...

RELACS shrink method applied for single print resist mask for LDD o...

Memory with disposable ARC for wordline formation

Photon assisted deposition of hard mask formation for use in manufa...

Thinning of trench and line or contact spacing by use of dual layer...

Binary and attenuating phase-shifting masks for multiple wavelengths

Optical technique to detect etch process termination

Method of forming integrated circuit features by oxidation of titan...

Patents Applicationslast 30 patents

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

SEMICONDUCTOR CONTACT FORMATION SYSTEM AND METHOD

Triple layer anti-reflective hard mask

Method of forming narrowly spaced flash memory contact openings and...

Hard mask removal process

Attenuating extreme ultraviolet (EUV) phase-shifting mask fabricati...