Kousa HIROTA

Person

Kokubunji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,020,233
- Issue date Jul 10, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,190,336
- Issue date Nov 17, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,500,912
- Issue date Aug 6, 2013
- Hitachi High-Technologies Corporation
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,236,701
- Issue date Aug 7, 2012
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching a sample
- Patent number 8,114,244
- Issue date Feb 14, 2012
- Hitachi High-Technologies Corporation
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150041060
- Publication date Feb 12, 2015
- Hitachi High-Technologies Corporation
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150024521
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140295583
- Publication date Oct 2, 2014
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120252200
- Publication date Oct 4, 2012
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20120085366
- Publication date Apr 12, 2012
- Hitachi High-Technologies Corporation
- Kousa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100197137
- Publication date Aug 5, 2010
- Masahiro SUMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SEASONING PLASMA PROCESSING APPARATUS, AND METHOD FOR DE...
- Publication number 20100178415
- Publication date Jul 15, 2010
- Hitachi High-Technologies Corporation
- Yasuhiro NISHIMORI
- B08 - CLEANING
Information Patent Application
METHOD FOR ETCHING A SAMPLE
- Publication number 20100159704
- Publication date Jun 24, 2010
- Hitachi High-Technologies Corporation
- Kousa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fabrication Method and Etching System
- Publication number 20070232067
- Publication date Oct 4, 2007
- Kousa Hirota
- H01 - BASIC ELECTRIC ELEMENTS

Kousa HIROTA

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Method for etching a sample

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR SEASONING PLASMA PROCESSING APPARATUS, AND METHOD FOR DE...

METHOD FOR ETCHING A SAMPLE

Semiconductor Fabrication Method and Etching System