Kousuke Fukuchi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,131,964
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,437,289
- Issue date Sep 6, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 11,308,182
- Issue date Apr 19, 2022
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,872,774
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Hao Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,783,220
- Issue date Sep 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus, data processing apparatus and data pro...
- Patent number 10,615,010
- Issue date Apr 7, 2020
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,073,818
- Issue date Sep 11, 2018
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,020,233
- Issue date Jul 10, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,865,439
- Issue date Jan 9, 2018
- Hitachi High-Technologies Corporation
- Shigeru Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,805,940
- Issue date Oct 31, 2017
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,741,629
- Issue date Aug 22, 2017
- Hitachi High-Technologies Corporation
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,190,336
- Issue date Nov 17, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220367298
- Publication date Nov 17, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220102226
- Publication date Mar 31, 2022
- HITACHI HIGH-TECH CORPORATION
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20200380066
- Publication date Dec 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20200203133
- Publication date Jun 25, 2020
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200035445
- Publication date Jan 30, 2020
- Hitachi High-Technologies Corporation
- Hao XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20180341625
- Publication date Nov 29, 2018
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170358504
- Publication date Dec 14, 2017
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160351405
- Publication date Dec 1, 2016
- Hitachi High-Technologies Corporation
- Kousuke FUKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20160336154
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160284610
- Publication date Sep 29, 2016
- Hitachi High-Technologies Corporation
- Tatehito USUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160211186
- Publication date Jul 21, 2016
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20150154145
- Publication date Jun 4, 2015
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150024521
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Kousuke Fukuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140295583
- Publication date Oct 2, 2014
- Hitachi High-Technologies Corporation
- Shigeru NAKAMOTO
- G01 - MEASURING TESTING

Kousuke Fukuchi

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus and plasma processing method

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus, data processing apparatus and data pro...

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD