Kouta Yoshikawa

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Kawasaki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Agent for post-etch treatment of silicon dielectric film, method of...
- Patent number 8,716,209
- Issue date May 6, 2014
- Fujitsu Limited
- Yasushi Kobayashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Process for producing silicic coating, silicic coating and semicond...
- Patent number 8,431,464
- Issue date Apr 30, 2013
- Fujitsu Limited
- Yasushi Kobayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,404,584
- Issue date Mar 26, 2013
- Fujitsu Limited
- Tadahiro Imada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interfacial roughness reducing film, wiring layer, semiconductor de...
- Patent number 8,164,166
- Issue date Apr 24, 2012
- Fujitsu Limited
- Tadahiro Imada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110207319
- Publication date Aug 25, 2011
- Fujitsu Limited
- Tadahiro Imada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCING SILICIC COATING, SILICIC COATING AND SEMICOND...
- Publication number 20100133692
- Publication date Jun 3, 2010
- Fujitsu Limited
- Yasushi Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF...
- Publication number 20100007031
- Publication date Jan 14, 2010
- Fujitsu Limited
- Yasushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DE...
- Publication number 20090085170
- Publication date Apr 2, 2009
- Fujitsu Limited
- Tadahiro Imada
- H01 - BASIC ELECTRIC ELEMENTS