Koutaro Endo

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 7,033,731
- Issue date Apr 25, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,864,036
- Issue date Mar 8, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and base material carrying layer of the...
- Patent number 6,787,284
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 6,455,228
- Issue date Sep 24, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,406,829
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Fluorinated polymers, photoresists and processes for microlithography
- Publication number 20050203262
- Publication date Sep 15, 2005
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20050123854
- Publication date Jun 9, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20050008972
- Publication date Jan 13, 2005
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20040152860
- Publication date Aug 5, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered body for photolithographic patterning
- Publication number 20020146645
- Publication date Oct 10, 2002
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoresist composition
- Publication number 20020061467
- Publication date May 23, 2002
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20020025495
- Publication date Feb 28, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Koutaro Endo

Person

Patents Grantslast 30 patents

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Positive resist composition and base material carrying layer of the...

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Patents Applicationslast 30 patents

Fluorinated polymers, photoresists and processes for microlithography

Positive resist composition and base material carrying layer of the...

Multilayered body for photolithographic patterning

Positive resist composition and base material carrying layer of the...

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Positive resist composition and base material carrying layer of the...