Koutarou TAKAHASHI

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,545,405
- Issue date Jan 28, 2020
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,526,266
- Issue date Jan 7, 2020
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,324,374
- Issue date Jun 18, 2019
- Fujifilm Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,120,281
- Issue date Nov 6, 2018
- FUJIFILM Corporation
- Koutarou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,011,576
- Issue date Jul 3, 2018
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,904,168
- Issue date Feb 27, 2018
- Fujifilm Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,316,908
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Koutarou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, and resis...
- Patent number 9,285,679
- Issue date Mar 15, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern forming method, resist pattern, crosslinkable negati...
- Patent number 8,889,339
- Issue date Nov 18, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,735,048
- Issue date May 27, 2014
- FUJIFILM Corporation
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20170351176
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITI...
- Publication number 20170003591
- Publication date Jan 5, 2017
- FUJIFILM CORPORATION
- Hidehiro MOCHIZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160320700
- Publication date Nov 3, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160282720
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Koutarou TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160280621
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160280675
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20160209746
- Publication date Jul 21, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE SA...
- Publication number 20150072274
- Publication date Mar 12, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIS...
- Publication number 20150010855
- Publication date Jan 8, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140370425
- Publication date Dec 18, 2014
- FUJIFILM CORPORATION
- Koutarou TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...
- Publication number 20140030640
- Publication date Jan 30, 2014
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20120301817
- Publication date Nov 29, 2012
- FUJIFILM CORPORATION
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Koutarou TAKAHASHI

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Active light sensitive or radiation sensitive resin composition, ac...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive composition, and resis...

Resist pattern forming method, resist pattern, crosslinkable negati...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

MANUFACTURING METHOD FOR ACTINIC RAY-SENSITIVE OR RADIATION-SENSITI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE SA...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIS...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...