Kouzou Kanagawa

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and apparatus cleaning method
- Patent number 12,087,599
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Hidemasa Aratake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,978,644
- Issue date May 7, 2024
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and apparatus cleaning method
- Patent number 11,745,213
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Hidemasa Aratake
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and processing liquid concentration...
- Patent number 11,615,971
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Teruaki Konishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,476,130
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,469,114
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and processing liquid reuse method
- Patent number 11,430,675
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Hideaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,736,556
- Issue date May 18, 2004
- Tokyo Electron Limited
- Kouzou Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,332,724
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Mitsuteru Yano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240242975
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20220392779
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220152780
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Yuichi DOUKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220105535
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Kotaro TSURUSAKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND APPARATUS CLEANING METHOD
- Publication number 20210114057
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Hidemasa Aratake
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND APPARATUS CLEANING METHOD
- Publication number 20210118704
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Hidemasa Aratake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111038
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210111054
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kouzou KANAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200286754
- Publication date Sep 10, 2020
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID CONCENTRATION...
- Publication number 20200194280
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Teruaki KONISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID REUSE METHOD
- Publication number 20190385869
- Publication date Dec 19, 2019
- TOKYO ELECTRON LIMITED
- Hideaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, MAINTE...
- Publication number 20170032983
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Koshi MUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exhaust system for use in processing a substrate
- Publication number 20070074745
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Yoshio Kimura
- H01 - BASIC ELECTRIC ELEMENTS

Kouzou Kanagawa

Person

Patents Grantslast 30 patents

Substrate processing apparatus and apparatus cleaning method

Substrate processing system and substrate processing method

Substrate processing apparatus and apparatus cleaning method

Substrate processing apparatus and processing liquid concentration...

Substrate processing apparatus, substrate processing method, and st...

Substrate processing system and substrate processing method

Substrate processing apparatus and processing liquid reuse method

Substrate processing apparatus

Substrate processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND APPARATUS CLEANING METHOD

SUBSTRATE PROCESSING APPARATUS AND APPARATUS CLEANING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID CONCENTRATION...

SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID REUSE METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, MAINTE...

Exhaust system for use in processing a substrate