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Pattern fabricating method
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Patent number 4,981,771
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Issue date Jan 1, 1991
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Hitachi, Ltd.
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Kozo Mochiji
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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X-ray exposure system
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Patent number 4,788,698
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Issue date Nov 29, 1988
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Hitachi, Ltd.
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Takeshi Kimura
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of measuring resist pattern
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Patent number 4,670,650
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Issue date Jun 2, 1987
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Hitachi, Ltd.
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Toshiharu Matsuzawa
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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X-ray mask with Ni pattern
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Patent number 4,599,737
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Issue date Jul 8, 1986
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Hitachi, Ltd.
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Takeshi Kimura
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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X-Ray lithographic system
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Patent number 4,514,857
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Issue date Apr 30, 1985
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Hitachi, Ltd.
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Takashi Kimura
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of forming patterns
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Patent number 4,403,151
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Issue date Sep 6, 1983
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Hitachi, Ltd.
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Kozo Mochiji
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of forming a pattern
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Patent number 4,307,176
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Issue date Dec 22, 1981
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Hitachi, Ltd.
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Kozo Mochiji
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY