Kozo OGINO

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Data generation method for semiconductor device, and electron beam...
- Patent number 8,429,573
- Issue date Apr 23, 2013
- Fujitsu Semiconductor Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and method of making a semiconductor device
- Patent number 8,298,732
- Issue date Oct 30, 2012
- Fujitsu Semiconductor Limited
- Masahiko Minemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using charged particle beam
- Patent number 8,158,312
- Issue date Apr 17, 2012
- Fujitsu Semiconductor Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Preparing data for hybrid exposure using both electron beam exposur...
- Patent number 8,141,009
- Issue date Mar 20, 2012
- Fujitsu Semiconductor Limited
- Masaaki Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parameter extracting method
- Patent number 8,048,600
- Issue date Nov 1, 2011
- Fujitsu Semiconductor Limited
- Kozo Ogino
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing semiconductor device or photomask
- Patent number 8,022,376
- Issue date Sep 20, 2011
- Fujitsu Semiconductor Ltd.
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure data preparation method and exposure method
- Patent number 7,977,018
- Issue date Jul 12, 2011
- Fujitsu Semiconductor Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam projection method
- Patent number 7,939,246
- Issue date May 10, 2011
- Fujitsu Semiconductor Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure data generator and method thereof
- Patent number 7,861,210
- Issue date Dec 28, 2010
- Fujitsu Semiconductor Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure data generation method and device, exposure data verificat...
- Patent number 7,707,540
- Issue date Apr 27, 2010
- Fujitsu Microelectronics Limited
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure data generator and method thereof
- Patent number 7,500,219
- Issue date Mar 3, 2009
- Fujitsu Microelectronics Limited
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern size correcting device and pattern size correcting method
- Patent number 7,240,307
- Issue date Jul 3, 2007
- Fujitsu Limited
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating backscattering intensity on the basis of lowe...
- Patent number 7,205,078
- Issue date Apr 17, 2007
- Fujitsu Limited
- Morimi Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rectangle/lattice data conversion method for charged particle beam...
- Patent number 6,677,089
- Issue date Jan 13, 2004
- Fujitsu Limited
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method
- Patent number 6,544,700
- Issue date Apr 8, 2003
- Fujitsu Limited
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE
- Publication number 20110207053
- Publication date Aug 25, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Masahiko Minemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD USING CHARGED PARTICLE BEAM
- Publication number 20110033789
- Publication date Feb 10, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure data generation method and device, exposure data verificat...
- Publication number 20100162198
- Publication date Jun 24, 2010
- FUJITSU MICROELECTRONICS LIMITED
- Kozo OGINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING...
- Publication number 20090239160
- Publication date Sep 24, 2009
- Fujitsu Microelectronics Limited
- Masaaki MIYAJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE OR PHOTOMASK
- Publication number 20090206282
- Publication date Aug 20, 2009
- Fujitsu Microelectronics Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM...
- Publication number 20090187878
- Publication date Jul 23, 2009
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE DATA PREPARATION METHOD AND EXPOSURE METHOD
- Publication number 20090176168
- Publication date Jul 9, 2009
- Fujitsu Microelectronics Limited
- Kozo OGINO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure data generator and method thereof
- Publication number 20090144693
- Publication date Jun 4, 2009
- Fujitsu Microelectronics Limited
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam projection method and program used therefor
- Publication number 20070196768
- Publication date Aug 23, 2007
- FUJITSU LIMITED
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure data generation method and device, exposure data verificat...
- Publication number 20070192758
- Publication date Aug 16, 2007
- FUJITSU LIMITED
- Kozo Ogino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Parameter extracting method
- Publication number 20070021938
- Publication date Jan 25, 2007
- FUJITSU LIMITED
- Kozo Ogino
- G01 - MEASURING TESTING
Information Patent Application
Exposure data generator and method thereof
- Publication number 20060195815
- Publication date Aug 31, 2006
- FUJITSU LIMITED
- Kozo Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Pattern size correcting device and pattern size correcting method
- Publication number 20050121628
- Publication date Jun 9, 2005
- FUJITSU LIMITED
- Hajime Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for generating backscattering intensity on the basis of lowe...
- Publication number 20050040344
- Publication date Feb 24, 2005
- FUJITSU LIMITED
- Morimi Osawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Rectangle/lattice data conversion method for charged particle beam...
- Publication number 20020177056
- Publication date Nov 28, 2002
- FUJITSU LIMITED
- Kozo Ogino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam exposure method and charged particle beam exp...
- Publication number 20020028398
- Publication date Mar 7, 2002
- Kozo Ogino
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Data generation method for semiconductor device, and electron beam...

Exposure method and method of making a semiconductor device

Exposure method using charged particle beam

Preparing data for hybrid exposure using both electron beam exposur...

Parameter extracting method

Method for manufacturing semiconductor device or photomask

Exposure data preparation method and exposure method

Charged particle beam projection method

Exposure data generator and method thereof

Exposure data generation method and device, exposure data verificat...

Exposure data generator and method thereof

Pattern size correcting device and pattern size correcting method

Method for generating backscattering intensity on the basis of lowe...

Rectangle/lattice data conversion method for charged particle beam...

Charged particle beam exposure method

Patents Applicationslast 30 patents

EXPOSURE METHOD AND METHOD OF MAKING A SEMICONDUCTOR DEVICE

EXPOSURE METHOD USING CHARGED PARTICLE BEAM

Exposure data generation method and device, exposure data verificat...

METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE OR PHOTOMASK

DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM...

EXPOSURE DATA PREPARATION METHOD AND EXPOSURE METHOD

Exposure data generator and method thereof

Charged particle beam projection method and program used therefor

Exposure data generation method and device, exposure data verificat...

Parameter extracting method

Exposure data generator and method thereof

Pattern size correcting device and pattern size correcting method

Method for generating backscattering intensity on the basis of lowe...

Rectangle/lattice data conversion method for charged particle beam...

Charged particle beam exposure method and charged particle beam exp...