Kris Roman

Person

Jerusalem, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Determining a critical dimension variation of a pattern
- Patent number 11,756,188
- Issue date Sep 12, 2023
- Applied Materials Israel Ltd.
- Vadim Vereschagin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Local shape deviation in a semiconductor specimen
- Patent number 11,686,571
- Issue date Jun 27, 2023
- Applied Materials Israel Ltd.
- Roman Kris
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, system and computer program product for 3D-NAND CDSEM metro...
- Patent number 11,651,509
- Issue date May 16, 2023
- Applied Materials Israel Ltd.
- Roman Kris
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Evaluating an intermediate product related to a three-dimensional N...
- Patent number 11,476,081
- Issue date Oct 18, 2022
- Applied Materials Israel Ltd.
- Roman Kris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxy metrology in fin field effect transistors
- Patent number 11,455,715
- Issue date Sep 27, 2022
- Applied Materials Israel Ltd.
- Jitendra Pradipkumar Chaudhary
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating a metrology recipe usable for examination of a semicondu...
- Patent number 11,443,420
- Issue date Sep 13, 2022
- Applied Materials Israel Ltd.
- Roman Kris
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measuring height difference in patterns on semiconductor wafers
- Patent number 11,301,983
- Issue date Apr 12, 2022
- Applied Materials Israel Ltd.
- Ishai Schwarzband
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining a critical dimension variation of a pattern
- Patent number 11,276,160
- Issue date Mar 15, 2022
- Applied Materials Israel Ltd.
- Vadim Vereschagin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Evaluating a hole formed in an intermediate product
- Patent number 11,056,404
- Issue date Jul 6, 2021
- Applied Materials Israel Ltd.
- Roman Kris
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measuring height difference in patterns on semiconductor wafers
- Patent number 10,748,272
- Issue date Aug 18, 2020
- Applied Materials Israel Ltd.
- Ishai Schwarzband
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for monitoring nanometric structures
- Patent number 10,731,979
- Issue date Aug 4, 2020
- Applied Materials Israel Ltd.
- Shimon Levi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Technique for measuring overlay between layers of a multilayer stru...
- Patent number 10,354,376
- Issue date Jul 16, 2019
- Applied Materials Israel Ltd.
- Yakov Weinberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Technique for measuring overlay between layers of a multilayer stru...
- Patent number 9,916,652
- Issue date Mar 13, 2018
- Applied Materials Israel Ltd.
- Yakov Weinberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
CD-SEM technique for wafers fabrication control
- Patent number 9,824,852
- Issue date Nov 21, 2017
- Applied Materials Israel Ltd.
- Roman Kris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for measuring overlay between layers of a multilayer stru...
- Patent number 9,530,199
- Issue date Dec 27, 2016
- Applied Materials Israel Ltd.
- Yakov Weinberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System, method and computer readable medium for detecting edges of...
- Patent number 9,165,376
- Issue date Oct 20, 2015
- Applied Materials Israel Ltd.
- Ishai Schwartzband
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High resolution wafer inspection system
- Patent number 7,973,919
- Issue date Jul 5, 2011
- Applied Materials Israel, Ltd.
- Dan Grossman
- G01 - MEASURING TESTING
Information Patent Grant
High resolution wafer inspection system
- Patent number 7,714,999
- Issue date May 11, 2010
- Applied Materials Israel, Ltd.
- Dan Grossman
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of corner roundness
- Patent number 7,590,278
- Issue date Sep 15, 2009
- Applied Materials, Inc.
- Kris Roman
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
EXAMINATION OF A HOLE FORMED IN A SEMICONDUCTOR SPECIMEN
- Publication number 20230420308
- Publication date Dec 28, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Rafael BISTRITZER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOCAL SHAPE DEVIATION IN A SEMICONDUCTOR SPECIMEN
- Publication number 20230069303
- Publication date Mar 2, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Roman KRIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EPITAXY METROLOGY IN FIN FIELD EFFECT TRANSISTORS
- Publication number 20220261979
- Publication date Aug 18, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Jitendra Pradipkumar CHAUDHARY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATING A METROLOGY RECIPE USABLE FOR EXAMINATION OF A SEMICONDU...
- Publication number 20220207681
- Publication date Jun 30, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Roman KRIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING A CRITICAL DIMENSION VARIATION OF A PATTERN
- Publication number 20220198639
- Publication date Jun 23, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Vadim VERESCHAGIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METRO...
- Publication number 20210383529
- Publication date Dec 9, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Roman KRIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATING A HOLE FORMED IN AN INTERMEDIATE PRODUCT
- Publication number 20210193536
- Publication date Jun 24, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Roman Kris
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATING AN INTERMEDIATE PRODUCT RELATED TO A THREE-DIMENSIONAL N...
- Publication number 20210066026
- Publication date Mar 4, 2021
- APPLIED MATERIALS ISRAEL LTD.
- Roman Kris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING HEIGHT DIFFERENCE IN PATTERNS ON SEMICONDUCTOR WAFERS
- Publication number 20200380668
- Publication date Dec 3, 2020
- APPLIED MATERIALS ISRAEL LTD.
- Ishai SCHWARZBAND
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING A CRITICAL DIMENSION VARIATION OF A PATTERN
- Publication number 20200327652
- Publication date Oct 15, 2020
- APPLIED MATERIALS ISRAEL LTD.
- Vadim VERESCHAGIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MONITORING NANOMETRIC STRUCTURES
- Publication number 20190219390
- Publication date Jul 18, 2019
- APPLIED MATERIALS ISRAEL, LTD.
- Shimon LEVI
- B82 - NANO-TECHNOLOGY
Information Patent Application
MEASURING HEIGHT DIFFERENCE IN PATTERNS ON SEMICONDUCTOR WAFERS
- Publication number 20180336675
- Publication date Nov 22, 2018
- APPLIED MATERIALS ISRAEL LTD.
- Ishai SCHWARZBAND
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...
- Publication number 20180268539
- Publication date Sep 20, 2018
- APPLIED MATERIALS ISRAEL LTD.
- Yakov WEINBERG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...
- Publication number 20170243343
- Publication date Aug 24, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Yakov WEINBERG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL
- Publication number 20170194125
- Publication date Jul 6, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Roman KRIS
- G01 - MEASURING TESTING
Information Patent Application
TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...
- Publication number 20170018066
- Publication date Jan 19, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Yakov WEINBERG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM, METHOD AND COMPUTER READABLE MEDIUM FOR DETECTING EDGES OF...
- Publication number 20140270470
- Publication date Sep 18, 2014
- APPLIED MATERIALS ISRAEL, LTD.
- Ishai Schwartzband
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH RESOLUTION WAFER INSPECTION SYSTEM
- Publication number 20100188658
- Publication date Jul 29, 2010
- Dan Grossman
- G01 - MEASURING TESTING
Information Patent Application
HIGH RESOLUTION WAFER INSPECTION SYSTEM
- Publication number 20080231845
- Publication date Sep 25, 2008
- Dan Grossman
- G01 - MEASURING TESTING
Information Patent Application
Measurement of corner roundness
- Publication number 20050069192
- Publication date Mar 31, 2005
- Kris Roman
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Determining a critical dimension variation of a pattern

Local shape deviation in a semiconductor specimen

Method, system and computer program product for 3D-NAND CDSEM metro...

Evaluating an intermediate product related to a three-dimensional N...

Epitaxy metrology in fin field effect transistors

Generating a metrology recipe usable for examination of a semicondu...

Measuring height difference in patterns on semiconductor wafers

Determining a critical dimension variation of a pattern

Evaluating a hole formed in an intermediate product

Measuring height difference in patterns on semiconductor wafers

Method for monitoring nanometric structures

Technique for measuring overlay between layers of a multilayer stru...

Technique for measuring overlay between layers of a multilayer stru...

CD-SEM technique for wafers fabrication control

Technique for measuring overlay between layers of a multilayer stru...

System, method and computer readable medium for detecting edges of...

High resolution wafer inspection system

High resolution wafer inspection system

Measurement of corner roundness

Patents Applicationslast 30 patents

EXAMINATION OF A HOLE FORMED IN A SEMICONDUCTOR SPECIMEN

LOCAL SHAPE DEVIATION IN A SEMICONDUCTOR SPECIMEN

EPITAXY METROLOGY IN FIN FIELD EFFECT TRANSISTORS

GENERATING A METROLOGY RECIPE USABLE FOR EXAMINATION OF A SEMICONDU...

DETERMINING A CRITICAL DIMENSION VARIATION OF A PATTERN

METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR 3D-NAND CDSEM METRO...

EVALUATING A HOLE FORMED IN AN INTERMEDIATE PRODUCT

EVALUATING AN INTERMEDIATE PRODUCT RELATED TO A THREE-DIMENSIONAL N...

MEASURING HEIGHT DIFFERENCE IN PATTERNS ON SEMICONDUCTOR WAFERS

DETERMINING A CRITICAL DIMENSION VARIATION OF A PATTERN

METHOD FOR MONITORING NANOMETRIC STRUCTURES

MEASURING HEIGHT DIFFERENCE IN PATTERNS ON SEMICONDUCTOR WAFERS

TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...

TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...

CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL

TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRU...

SYSTEM, METHOD AND COMPUTER READABLE MEDIUM FOR DETECTING EDGES OF...

HIGH RESOLUTION WAFER INSPECTION SYSTEM

HIGH RESOLUTION WAFER INSPECTION SYSTEM

Measurement of corner roundness