Krishna NITTALA

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods, systems, and apparatus for processing substrates using one...
- Patent number 12,131,913
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron concentration tunability in boron-silicon films
- Patent number 11,961,739
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to reduce material surface roughness
- Patent number 11,939,674
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous silicon-based films resistant to crystallization
- Patent number 11,827,514
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Aykut Aydin
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 11,721,545
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods, systems, and apparatus for processing substrates using one...
- Patent number 11,694,902
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping semiconductor films
- Patent number 11,676,813
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to reduce material surface roughness
- Patent number 11,618,949
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen management in plasma deposited films
- Patent number 11,562,902
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling concentration profiles for deposited films using machin...
- Patent number 11,532,525
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Anton V Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced lift pin design to eliminate local thickness non-uniformit...
- Patent number 11,508,611
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Kalyanjit Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation via pulsed RF plasma
- Patent number 11,443,919
- Issue date Sep 13, 2022
- Applied Materials, Inc.
- Krishna Nittala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardmasks and processes for forming hardmasks by plasma-enhanced ch...
- Patent number 11,421,324
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Jui-Yuan Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polysilicon liners
- Patent number 11,170,990
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced lift pin design to eliminate local thickness non-uniformit...
- Patent number 10,490,436
- Issue date Nov 26, 2019
- Applied Materials, Inc.
- Kalyanjit Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-K oxide deposition by hydrolysis and condensation
- Patent number 9,245,739
- Issue date Jan 26, 2016
- Lam Research Corporation
- Nicholas Muga Ndiege
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20240266171
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20230343586
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Anup Kumar SINGH
- B08 - CLEANING
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...
- Publication number 20230317463
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Krishna NITTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION FOR REDUCED HYDROGEN INCORPORATION IN AMORPHOUS SI...
- Publication number 20230298892
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS
- Publication number 20230203652
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
- Publication number 20230146981
- Publication date May 11, 2023
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...
- Publication number 20230118964
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Anton V. Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...
- Publication number 20220285232
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Anton V. Baryshnikov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...
- Publication number 20220262643
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Krishna NITTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASKS AND PROCESSES FOR FORMING HARDMASKS BY PLASMA ENHANCED CH...
- Publication number 20220119953
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jui-Yuan HSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS
- Publication number 20220108892
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Yi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20220102141
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Anup Kumar SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPING SEMICONDUCTOR FILMS
- Publication number 20220093390
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Aykut Aydin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS
- Publication number 20220020599
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
- Publication number 20220020583
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS
- Publication number 20210140045
- Publication date May 13, 2021
- Applied Materials, Inc.
- Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMORPHOUS SILICON-BASED FILMS RESISTANT TO CRYSTALLIZATION
- Publication number 20210130174
- Publication date May 6, 2021
- Applied Materials, Inc.
- Aykut Aydin
- C01 - INORGANIC CHEMISTRY
Information Patent Application
POLYSILICON LINERS
- Publication number 20200266052
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Krishna NITTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION VIA PULSED RF PLASMA
- Publication number 20200258720
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Krishna NITTALA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED LIFT PIN DESIGN TO ELIMINATE LOCAL THICKNESS NON-UNIFORMIT...
- Publication number 20200058538
- Publication date Feb 20, 2020
- Applied Materials, Inc.
- Kalyanjit GHOSH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED LIFT PIN DESIGN TO ELIMINATE LOCAL THICKNESS NON-UNIFORMIT...
- Publication number 20170125280
- Publication date May 4, 2017
- Applied Materials, Inc.
- Kalyanjit GHOSH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K OXIDE DEPOSITION BY HYDROLYSIS AND CONDENSATION
- Publication number 20150004806
- Publication date Jan 1, 2015
- LAM RESEARCH CORPORATION
- Nicholas Muga Ndiege
- H01 - BASIC ELECTRIC ELEMENTS

Krishna NITTALA

Person

Patents Grantslast 30 patents

Methods, systems, and apparatus for processing substrates using one...

Method of using dual frequency RF power in a process chamber

Boron concentration tunability in boron-silicon films

Methods to reduce material surface roughness

Amorphous silicon-based films resistant to crystallization

Method of using dual frequency RF power in a process chamber

Methods, systems, and apparatus for processing substrates using one...

Doping semiconductor films

Methods to reduce material surface roughness

Hydrogen management in plasma deposited films

Controlling concentration profiles for deposited films using machin...

Enhanced lift pin design to eliminate local thickness non-uniformit...

Film formation via pulsed RF plasma

Hardmasks and processes for forming hardmasks by plasma-enhanced ch...

Polysilicon liners

Enhanced lift pin design to eliminate local thickness non-uniformit...

Low-K oxide deposition by hydrolysis and condensation

Patents Applicationslast 30 patents

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...

ION IMPLANTATION FOR REDUCED HYDROGEN INCORPORATION IN AMORPHOUS SI...

METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS

HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS

CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...

CONTROLLING CONCENTRATION PROFILES FOR DEPOSITED FILMS USING MACHIN...

METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...

HARDMASKS AND PROCESSES FOR FORMING HARDMASKS BY PLASMA ENHANCED CH...

BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

DOPING SEMICONDUCTOR FILMS

INTEGRATION PROCESSES UTILIZING BORON-DOPED SILICON MATERIALS

HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS

METHODS TO REDUCE MATERIAL SURFACE ROUGHNESS

AMORPHOUS SILICON-BASED FILMS RESISTANT TO CRYSTALLIZATION

POLYSILICON LINERS

FILM FORMATION VIA PULSED RF PLASMA

ENHANCED LIFT PIN DESIGN TO ELIMINATE LOCAL THICKNESS NON-UNIFORMIT...

ENHANCED LIFT PIN DESIGN TO ELIMINATE LOCAL THICKNESS NON-UNIFORMIT...

LOW-K OXIDE DEPOSITION BY HYDROLYSIS AND CONDENSATION