Krishna P. Murella

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
High oxide film removal rate shallow trench (STI) chemical mechanic...
- Patent number 12,091,581
- Issue date Sep 17, 2024
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,692,110
- Issue date Jul 4, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,667,839
- Issue date Jun 6, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,608,451
- Issue date Mar 21, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Oxide chemical mechanical planarization (CMP) polishing compositions
- Patent number 11,549,034
- Issue date Jan 10, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,326,076
- Issue date May 10, 2022
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low oxide trench dishing shallow trench isolation chemical mechanic...
- Patent number 11,254,839
- Issue date Feb 22, 2022
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppressing SiN removal rates and reducing oxide trench dishing for...
- Patent number 11,180,678
- Issue date Nov 23, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization of films comprising elemental sil...
- Patent number 11,111,415
- Issue date Sep 7, 2021
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,078,417
- Issue date Aug 3, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,072,726
- Issue date Jul 27, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite particles, method of refining and use thereof
- Patent number 10,894,906
- Issue date Jan 19, 2021
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,669,449
- Issue date Jun 2, 2020
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite particles, method of refining and use thereof
- Patent number 10,421,890
- Issue date Sep 24, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,418,247
- Issue date Sep 17, 2019
- VERSUM MATERIALS US, LLC
- Krishna P. Murella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,109,493
- Issue date Oct 23, 2018
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing slurry compositions and method using...
- Patent number 9,305,806
- Issue date Apr 5, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry compositions and method using...
- Patent number 8,974,692
- Issue date Mar 10, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-step chemical-mechanical planarization for damascene structures...
- Patent number 6,555,466
- Issue date Apr 29, 2003
- Speedfam Corporation
- Thomas Laursen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pad conditioning for copper-based semiconductor wafers
- Patent number 6,387,188
- Issue date May 14, 2002
- SpeedFam-IPEC Corporation
- Thomas Laursen
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Shared Data Induced Quality Control For A Chemical Mechanical Plana...
- Publication number 20230325751
- Publication date Oct 12, 2023
- VERSUM MATERIALS US, LLC
- Cesar Clavero
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Low Dishing Oxide CMP Polishing Compositions For Shallow Trench Iso...
- Publication number 20230193079
- Publication date Jun 22, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
High Oxide Film Removal Rate Shallow Trench (STI) Chemical Mechanic...
- Publication number 20230020073
- Publication date Jan 19, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20210324270
- Publication date Oct 21, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20210309885
- Publication date Oct 7, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanic...
- Publication number 20210179890
- Publication date Jun 17, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Shallow Trench Isolation Chemical And Mechanical Polishing Slurry
- Publication number 20200270479
- Publication date Aug 27, 2020
- VERSUM MATERIALS US, LLC
- Joseph D. Rose
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...
- Publication number 20200239736
- Publication date Jul 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...
- Publication number 20200239735
- Publication date Jul 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For...
- Publication number 20200131404
- Publication date Apr 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Application
Composite Abrasive Particles for Chemical Mechanical Planarization...
- Publication number 20200115590
- Publication date Apr 16, 2020
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Application
High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dis...
- Publication number 20200095502
- Publication date Mar 26, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions
- Publication number 20200048496
- Publication date Feb 13, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization Of Films Comprising Elemental Sil...
- Publication number 20200032108
- Publication date Jan 30, 2020
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- B24 - GRINDING POLISHING
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002607
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002608
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002574
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Particles, Method of Refining And Use Thereof
- Publication number 20190359868
- Publication date Nov 28, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Application
Composite Particles, Method of Refining and Use Thereof
- Publication number 20190127607
- Publication date May 2, 2019
- VERSUM MATERIALS US, LLC
- Joseph D. Rose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Planarization of Films Comprising Elemental Sil...
- Publication number 20180244955
- Publication date Aug 30, 2018
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- B24 - GRINDING POLISHING
Information Patent Application
Composite Particles, Method of Refining and Use Thereof
- Publication number 20170283673
- Publication date Oct 5, 2017
- Versum Materials US, LLC
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Abrasive Particles For Chemical Mechanical Planarization...
- Publication number 20170133236
- Publication date May 11, 2017
- Air Products and Chemicals, Inc.
- Krishna P. Murella
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Abrasive Particles For Chemical Mechanical Planarization...
- Publication number 20160200944
- Publication date Jul 14, 2016
- Air Products and Chemicals, Inc.
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Met...
- Publication number 20160122590
- Publication date May 5, 2016
- Air Products and Chemicals, Inc.
- Blake J. Lew
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Slurry Compositions and Method Using...
- Publication number 20150132956
- Publication date May 14, 2015
- Air Products and Chemicals, Inc.
- Xiaobo SHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Polishing Slurry Compositions and Method Using...
- Publication number 20150004788
- Publication date Jan 1, 2015
- Air Products and Chemicals, Inc.
- Xiaobo SHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for polishing copper on a workpiece surface
- Publication number 20060255016
- Publication date Nov 16, 2006
- Novellus Systems, Inc.
- Julia Svirchevski
- B24 - GRINDING POLISHING

Krishna P. Murella

Person

Patents Grantslast 30 patents

High oxide film removal rate shallow trench (STI) chemical mechanic...

Low oxide trench dishing chemical mechanical polishing

Low oxide trench dishing chemical mechanical polishing

Shallow trench isolation (STI) chemical mechanical planarization (C...

Oxide chemical mechanical planarization (CMP) polishing compositions

Shallow trench isolation (STI) chemical mechanical planarization (C...

Low oxide trench dishing shallow trench isolation chemical mechanic...

Suppressing SiN removal rates and reducing oxide trench dishing for...

Chemical mechanical planarization of films comprising elemental sil...

Low oxide trench dishing chemical mechanical polishing

Low oxide trench dishing chemical mechanical polishing

Composite particles, method of refining and use thereof

Composite abrasive particles for chemical mechanical planarization...

Composite particles, method of refining and use thereof

Composite abrasive particles for chemical mechanical planarization...

Composite abrasive particles for chemical mechanical planarization...

Chemical mechanical polishing slurry compositions and method using...

Chemical mechanical polishing slurry compositions and method using...

Two-step chemical-mechanical planarization for damascene structures...

Pad conditioning for copper-based semiconductor wafers

Patents Applicationslast 30 patents

Shared Data Induced Quality Control For A Chemical Mechanical Plana...

Low Dishing Oxide CMP Polishing Compositions For Shallow Trench Iso...

High Oxide Film Removal Rate Shallow Trench (STI) Chemical Mechanic...

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanic...

Shallow Trench Isolation Chemical And Mechanical Polishing Slurry

Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...

Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...

Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For...

Composite Abrasive Particles for Chemical Mechanical Planarization...

High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dis...

Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions

Chemical Mechanical Planarization Of Films Comprising Elemental Sil...

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Composite Particles, Method of Refining And Use Thereof

Composite Particles, Method of Refining and Use Thereof

Chemical Mechanical Planarization of Films Comprising Elemental Sil...

Composite Particles, Method of Refining and Use Thereof

Composite Abrasive Particles For Chemical Mechanical Planarization...

Composite Abrasive Particles For Chemical Mechanical Planarization...

Chemical Mechanical Polishing Slurry for Reducing Corrosion and Met...

Chemical Mechanical Polishing Slurry Compositions and Method Using...

Chemical Mechanical Polishing Slurry Compositions and Method Using...

Method for polishing copper on a workpiece surface