Kristen Scheer

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for forming an oxynitride layer by performing oxi...
- Patent number 7,517,814
- Issue date Apr 14, 2009
- Tokyo Electron, Ltd.
- Cory S. Wajda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming an oxynitride layer
- Patent number 7,501,352
- Issue date Mar 10, 2009
- Tokyo Electron, Ltd.
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Patent number 7,235,440
- Issue date Jun 26, 2007
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming uniform ultra-thin oxynitride layers
- Patent number 7,202,186
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- David L O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming gate oxides having multiple thicknesses
- Patent number 7,160,771
- Issue date Jan 9, 2007
- International Business Machines Corporation
- Anthony I-Chih Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interfacial oxidation process for high-k gate dielectric process in...
- Patent number 6,974,779
- Issue date Dec 13, 2005
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a uniform distribution of nitrogen in silicon ox...
- Patent number 6,930,060
- Issue date Aug 16, 2005
- International Business Machines Corporation
- Anthony I. Chou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and system for forming an oxynitride layer by performing oxi...
- Publication number 20060228871
- Publication date Oct 12, 2006
- Cory S. Wajda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for forming an oxynitride layer
- Publication number 20060228902
- Publication date Oct 12, 2006
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming gate oxides having multiple thicknesses
- Publication number 20050118764
- Publication date Jun 2, 2005
- Anthony I-Chih Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interfacial oxidation process for high-k gate dielectric process in...
- Publication number 20050059259
- Publication date Mar 17, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Publication number 20050026453
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming uniform ultra-thin oxynitride layers
- Publication number 20050026459
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A UNIFORM DISTRIBUTION OF NITROGEN IN SILICON OX...
- Publication number 20040256664
- Publication date Dec 23, 2004
- International Business Machines Corporation
- Anthony I. Chou
- H01 - BASIC ELECTRIC ELEMENTS

Kristen Scheer

Person

Patents Grantslast 30 patents

Method and system for forming an oxynitride layer by performing oxi...

Method and system for forming an oxynitride layer

Formation of ultra-thin oxide layers by self-limiting interfacial o...

Method of forming uniform ultra-thin oxynitride layers

Forming gate oxides having multiple thicknesses

Interfacial oxidation process for high-k gate dielectric process in...

Method for forming a uniform distribution of nitrogen in silicon ox...

Patents Applicationslast 30 patents

Method and system for forming an oxynitride layer by performing oxi...

Method and system for forming an oxynitride layer

Forming gate oxides having multiple thicknesses

Interfacial oxidation process for high-k gate dielectric process in...

Formation of ultra-thin oxide layers by self-limiting interfacial o...

Method of forming uniform ultra-thin oxynitride layers

METHOD FOR FORMING A UNIFORM DISTRIBUTION OF NITROGEN IN SILICON OX...