Kuang-Neng Chen

Person

White Plains, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming semiconductor structures with contact holes
- Patent number 9,449,822
- Issue date Sep 20, 2016
- GLOBALFOUNDRIES, INC.
- Wai-Kin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to mitigate resist pattern critical dimension variation in a...
- Patent number 9,316,916
- Issue date Apr 19, 2016
- GLOBALFOUNRIES INC.
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure photolithography methods
- Patent number 9,235,119
- Issue date Jan 12, 2016
- GLOBALFOUNDRIES Inc.
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Metallic mask patterning process for minimizing collateral etch of...
- Patent number 9,093,387
- Issue date Jul 28, 2015
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 9,040,225
- Issue date May 26, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 8,999,624
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,986,918
- Issue date Mar 24, 2015
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,932,796
- Issue date Jan 13, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of multiple patterning to form semiconductor devices
- Patent number 8,871,596
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition containing a protected hydroxyl group for n...
- Patent number 8,846,295
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist compositions
- Patent number 8,846,296
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon containing coating compositions and methods of use
- Patent number 8,802,347
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Developable bottom antireflective coating compositions for negative...
- Patent number 8,715,907
- Issue date May 6, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Forming sub-lithographic patterns using double exposure
- Patent number 8,609,327
- Issue date Dec 17, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure photolithography methods
- Patent number 8,568,960
- Issue date Oct 29, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of fabricating dual damascene structures using a multilevel...
- Patent number 8,536,031
- Issue date Sep 17, 2013
- International Business Machines Corporation
- John C. Arnold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods for shrinking a photoresist cr...
- Patent number 8,394,573
- Issue date Mar 12, 2013
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reducing side lobe printing using a barrier layer
- Patent number 8,268,542
- Issue date Sep 18, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure photolithography methods and photoresist composit...
- Patent number 8,236,476
- Issue date Aug 7, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for removing threshold voltage adjusting layer with external...
- Patent number 8,227,307
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography focus improvement by reduction of autofocus radiat...
- Patent number 8,227,180
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Timothy Allan Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 8,202,678
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for selectively adjusting local resist pattern dimension wit...
- Patent number 8,163,466
- Issue date Apr 24, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and method for multiple exposures with mul...
- Patent number 7,838,198
- Issue date Nov 23, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and method for multiple exposures with mul...
- Patent number 7,838,200
- Issue date Nov 23, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and process for multiple exposures with mu...
- Patent number 7,803,521
- Issue date Sep 28, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Programmable fuse/non-volatile memory structures in BEOL regions us...
- Patent number 7,633,079
- Issue date Dec 15, 2009
- International Business Machines Corporation
- Kuang-Neng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet developable bottom antireflective coating composition and metho...
- Patent number 7,563,563
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Si-containing polymers for nano-pattern device fabrication
- Patent number 7,560,222
- Issue date Jul 14, 2009
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of improving single layer resist patterning scheme
- Patent number 7,407,736
- Issue date Aug 5, 2008
- International Business Machines Corporation
- Kuang-Jung J. Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METALLIC MASK PATTERNING PROCESS FOR MINIMIZING COLLATERAL ETCH OF...
- Publication number 20150194320
- Publication date Jul 9, 2015
- International Business Machines Corporation
- SCOTT D. ALLEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...
- Publication number 20150050601
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE PHOTOLITHOGRAPHY METHODS
- Publication number 20140349237
- Publication date Nov 27, 2014
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...
- Publication number 20140072915
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20140072916
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF MULTIPLE PATTERNING TO FORM SEMICONDUCTOR DEVICES
- Publication number 20140024191
- Publication date Jan 23, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...
- Publication number 20140004712
- Publication date Jan 2, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...
- Publication number 20130288178
- Publication date Oct 31, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMIN...
- Publication number 20130164680
- Publication date Jun 27, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20130122421
- Publication date May 16, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE...
- Publication number 20130040238
- Publication date Feb 14, 2013
- International Business Machines Corporation
- KUANG-JUNG CHEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of fabricating dual damascene structures using a multilevel...
- Publication number 20130026639
- Publication date Jan 31, 2013
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITIONS
- Publication number 20120214099
- Publication date Aug 23, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS
- Publication number 20120178027
- Publication date Jul 12, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMIN...
- Publication number 20120122031
- Publication date May 17, 2012
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS FOR SHRINKING A PHOTORESIST CR...
- Publication number 20120070787
- Publication date Mar 22, 2012
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURES WITH CONTACT HOLES
- Publication number 20120028476
- Publication date Feb 2, 2012
- International Business Machines Corporation
- Wai-Kin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20110256486
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING DUAL DAMASCENE STRUCTURES USING A MULTILEVEL...
- Publication number 20110204523
- Publication date Aug 25, 2011
- International Business Machines Corporation
- John C. Arnold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE
- Publication number 20110111345
- Publication date May 12, 2011
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR REMOVING THRESHOLD VOLTAGE ADJUSTING LAYER WITH EXTERNAL...
- Publication number 20100330810
- Publication date Dec 30, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MITIGATE RESIST PATTERN CRITICAL DIMENSION VARIATION IN A...
- Publication number 20100255428
- Publication date Oct 7, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MU...
- Publication number 20100248147
- Publication date Sep 30, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SELECTIVELY ADJUSTING LOCAL RESIST PATTERN DIMENSION WIT...
- Publication number 20100209853
- Publication date Aug 19, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING SUB-LITHOGRAPHIC PATTERNS USING DOUBLE EXPOSURE
- Publication number 20100009298
- Publication date Jan 14, 2010
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...
- Publication number 20090291392
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...
- Publication number 20090208865
- Publication date Aug 20, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS
- Publication number 20090176174
- Publication date Jul 9, 2009
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MUL...
- Publication number 20090155715
- Publication date Jun 18, 2009
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MUL...
- Publication number 20090155718
- Publication date Jun 18, 2009
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kuang-Neng Chen

Person

Patents Grantslast 30 patents

Method of forming semiconductor structures with contact holes

Method to mitigate resist pattern critical dimension variation in a...

Exposure photolithography methods

Metallic mask patterning process for minimizing collateral etch of...

Developable bottom antireflective coating composition and pattern f...

Developable bottom antireflective coating composition and pattern f...

Hybrid photoresist composition and pattern forming method using the...

Hybrid photoresist composition and pattern forming method using the...

Method of multiple patterning to form semiconductor devices

Photoresist composition containing a protected hydroxyl group for n...

Photoresist compositions

Silicon containing coating compositions and methods of use

Developable bottom antireflective coating compositions for negative...

Forming sub-lithographic patterns using double exposure

Multiple exposure photolithography methods

Method of fabricating dual damascene structures using a multilevel...

Photoresist compositions and methods for shrinking a photoresist cr...

Method for reducing side lobe printing using a barrier layer

Multiple exposure photolithography methods and photoresist composit...

Method for removing threshold voltage adjusting layer with external...

Photolithography focus improvement by reduction of autofocus radiat...

Wet developable bottom antireflective coating composition and metho...

Method for selectively adjusting local resist pattern dimension wit...

Photoresist compositions and method for multiple exposures with mul...

Photoresist compositions and method for multiple exposures with mul...

Photoresist compositions and process for multiple exposures with mu...

Programmable fuse/non-volatile memory structures in BEOL regions us...

Wet developable bottom antireflective coating composition and metho...

Si-containing polymers for nano-pattern device fabrication

Methods of improving single layer resist patterning scheme

Patents Applicationslast 30 patents

METALLIC MASK PATTERNING PROCESS FOR MINIMIZING COLLATERAL ETCH OF...

DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...

EXPOSURE PHOTOLITHOGRAPHY METHODS

PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

METHOD OF MULTIPLE PATTERNING TO FORM SEMICONDUCTOR DEVICES

DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...

PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR N...

PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMIN...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE...

Method of fabricating dual damascene structures using a multilevel...

PHOTORESIST COMPOSITIONS

MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS

PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMIN...

PHOTORESIST COMPOSITIONS AND METHODS FOR SHRINKING A PHOTORESIST CR...

METHOD OF FORMING SEMICONDUCTOR STRUCTURES WITH CONTACT HOLES

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

METHOD OF FABRICATING DUAL DAMASCENE STRUCTURES USING A MULTILEVEL...

SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE

METHOD FOR REMOVING THRESHOLD VOLTAGE ADJUSTING LAYER WITH EXTERNAL...

METHOD TO MITIGATE RESIST PATTERN CRITICAL DIMENSION VARIATION IN A...

PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MU...

METHOD FOR SELECTIVELY ADJUSTING LOCAL RESIST PATTERN DIMENSION WIT...

FORMING SUB-LITHOGRAPHIC PATTERNS USING DOUBLE EXPOSURE

WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHO...

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIAT...

MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS

PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MUL...

PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MUL...