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Kuilong Wang
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Portland, OR, US
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last 30 patents
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Patent Grant
Method for forming hybrid device gates
Patent number
7,125,775
Issue date
Oct 24, 2006
Integrated Device Technology, Inc.
Kuilong Wang
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Dual-mask etch of dual-poly gate in CMOS processing
Patent number
6,534,414
Issue date
Mar 18, 2003
Integrated Device Technology, Inc.
Kuilong Wang
H01 - BASIC ELECTRIC ELEMENTS