Kumiko Hayashi

Person

Annaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, laminate, and pattern forming pro...
- Patent number 12,055,853
- Issue date Aug 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy-containing, isocyanurate-modified silicone resin, photosensit...
- Patent number 11,294,282
- Issue date Apr 5, 2022
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mesogen-silicon compound (co)polymer and thermoplastic elastomer
- Patent number 11,142,612
- Issue date Oct 12, 2021
- Shin-Etsu Chemical Co., Ltd.
- Akira Uta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240288772
- Publication date Aug 29, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240210831
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING
- Publication number 20240184206
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240160105
- Publication date May 16, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, LAYERED...
- Publication number 20220236644
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PRO...
- Publication number 20200209751
- Publication date Jul 2, 2020
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL MESOGEN-SILICON COMPOUND (CO)POLYMER AND THERMOPLASTIC ELASTOMER
- Publication number 20190352466
- Publication date Nov 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Akira Uta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EPOXY-CONTAINING, ISOCYANURATE-MODIFIED SILICONE RESIN, PHOTOSENSIT...
- Publication number 20190064666
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kumiko Hayashi

Person

Patents Grantslast 30 patents

Photosensitive resin composition, laminate, and pattern forming pro...

Epoxy-containing, isocyanurate-modified silicone resin, photosensit...

Mesogen-silicon compound (co)polymer and thermoplastic elastomer

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, LAYERED...

PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, AND PATTERN FORMING PRO...

NOVEL MESOGEN-SILICON COMPOUND (CO)POLYMER AND THERMOPLASTIC ELASTOMER

EPOXY-CONTAINING, ISOCYANURATE-MODIFIED SILICONE RESIN, PHOTOSENSIT...