Kun-Ming Tsai

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Miaoli, TW

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Patents Grantslast 30 patents

Information Patent Grant
High-stability polyurethane polishing pad
- Patent number 9,481,070
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
HIGH-STABILITY POLYURETHANE POLISHING PAD
- Publication number 20160176012
- Publication date Jun 23, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...