Kun-Wa Kuok

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
CMOS FinFET structures including work-function materials having dif...
- Patent number 11,961,768
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having doped work function metal layer
- Patent number 11,791,338
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hsiung Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS finFET structures including work-function materials having dif...
- Patent number 11,682,589
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,244,945
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hsiung Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS FinFET structures including work-function materials having dif...
- Patent number 10,804,161
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING DOPED WORK FUNCTION METAL LAYER
- Publication number 20230369331
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hsiung HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS FinFET Structures Including Work-Function Materials Having Dif...
- Publication number 20230274983
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING DOPED WORK FUNCTION METAL LAYER
- Publication number 20220149041
- Publication date May 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hsiung HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20210057408
- Publication date Feb 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hsiung HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS FinFET Structures Including Work-Function Materials Having Dif...
- Publication number 20210043521
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Structures and Methods of Forming the Same
- Publication number 20180174922
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen Chiu
- H01 - BASIC ELECTRIC ELEMENTS

Kun-Wa Kuok

Person

Patents Grantslast 30 patents

CMOS FinFET structures including work-function materials having dif...

Semiconductor device having doped work function metal layer

CMOS finFET structures including work-function materials having dif...

Semiconductor device and manufacturing method thereof

CMOS FinFET structures including work-function materials having dif...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING DOPED WORK FUNCTION METAL LAYER

CMOS FinFET Structures Including Work-Function Materials Having Dif...

SEMICONDUCTOR DEVICE HAVING DOPED WORK FUNCTION METAL LAYER

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

CMOS FinFET Structures Including Work-Function Materials Having Dif...

FinFET Structures and Methods of Forming the Same