Kunie Ogata

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method
- Patent number 8,916,229
- Issue date Dec 23, 2014
- Tokyo Electron Limited
- Akira Miyata
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate treatment apparatus, substrate treatment method and non-t...
- Patent number 8,885,140
- Issue date Nov 11, 2014
- Tokyo Electron Limited
- Tomohiro Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, computer-readable storage medium, and...
- Patent number 8,308,381
- Issue date Nov 13, 2012
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, computer-readable storage medium and s...
- Patent number 8,253,077
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and apparatus
- Patent number 8,231,285
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature setting method and apparatus for a thermal processing p...
- Patent number 8,135,487
- Issue date Mar 13, 2012
- Tokyo Electron Limited
- Megumi Jyousaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate measuring method, computer-readable recording medium reco...
- Patent number 8,041,525
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Yoshihiro Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, computer-readable storage medium and s...
- Patent number 7,985,516
- Issue date Jul 26, 2011
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, computer-readable storage medium, and...
- Patent number 7,968,260
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature setting method of thermal processing plate, computer-re...
- Patent number 7,968,825
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Megumi Jyousaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature setting method for thermal processing plate, temperatur...
- Patent number 7,957,828
- Issue date Jun 7, 2011
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature setting method of thermal processing plate, computer-re...
- Patent number 7,897,896
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Megumi Jyousaka
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing method, program, computer-readable storage med...
- Patent number 7,884,950
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Heiko Weichert
- G01 - MEASURING TESTING
Information Patent Grant
Substrate-processing apparatus, substrate-processing method, substr...
- Patent number 7,867,674
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate-processing apparatus, substrate-processing method, substr...
- Patent number 7,867,673
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate-processing apparatus, substrate-processing method, substr...
- Patent number 7,862,966
- Issue date Jan 4, 2011
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measuring method, computer-readable recording medium reco...
- Patent number 7,822,574
- Issue date Oct 26, 2010
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method
- Patent number 7,780,366
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming method
- Patent number 7,648,292
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Kunie Ogata
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 7,488,127
- Issue date Feb 10, 2009
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and information storage apparatus and method
- Patent number 7,031,792
- Issue date Apr 18, 2006
- Tokyo Electron Limited
- Yuji Yoshimoto
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate processing apparatus and information storage apparatus an...
- Patent number 6,990,380
- Issue date Jan 24, 2006
- Tokyo Electron Limited
- Yuji Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern forming apparatus and method thereof
- Patent number 6,984,477
- Issue date Jan 10, 2006
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 6,713,120
- Issue date Mar 30, 2004
- Tokyo Electron Limited
- Yuji Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 6,593,045
- Issue date Jul 15, 2003
- Tokyo Electron Limited
- Norikatsu Sato
- G01 - MEASURING TESTING
Information Patent Grant
Resist processing method controlled through reflectivity data
- Patent number 6,541,170
- Issue date Apr 1, 2003
- Tokyo Electron Limited
- Yuji Fukuda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,457,882
- Issue date Oct 1, 2002
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 6,431,769
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Yuji Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parts maintenance managing system
- Patent number 6,394,670
- Issue date May 28, 2002
- Tokyo Electron Limited
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist coating and developing unit
- Patent number 6,313,903
- Issue date Nov 6, 2001
- Tokyo Electron Limited
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND NON-T...
- Publication number 20130057836
- Publication date Mar 7, 2013
- TOKYO ELECTRON LIMITED
- Tomohiro NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20120058253
- Publication date Mar 8, 2012
- TOKYO ELECTRON LIMITED
- Akira Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...
- Publication number 20110242513
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND...
- Publication number 20110209826
- Publication date Sep 1, 2011
- TOKYO ELECTRON LIMITED
- Masahide TADOKORO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD
- Publication number 20100047702
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...
- Publication number 20090269686
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND...
- Publication number 20090214963
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Masahide TADOKORO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MED...
- Publication number 20090181316
- Publication date Jul 16, 2009
- TOKYO ELECTRON LIMITED
- Heiko Weichert
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...
- Publication number 20090162759
- Publication date Jun 25, 2009
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...
- Publication number 20090104548
- Publication date Apr 23, 2009
- TOKYO ELECTRON LIMITED
- Michio Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...
- Publication number 20090047586
- Publication date Feb 19, 2009
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATUR...
- Publication number 20080257495
- Publication date Oct 23, 2008
- TOKYO ELECTRON LIMITED
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATUR...
- Publication number 20080257496
- Publication date Oct 23, 2008
- TOKYO ELECTRON LIMITED
- Megumi JYOUSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN FORMING METHOD
- Publication number 20080182211
- Publication date Jul 31, 2008
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-RE...
- Publication number 20080142508
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Megumi JYOUSAKA
- G05 - CONTROLLING REGULATING
Information Patent Application
TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-RE...
- Publication number 20080105669
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Megumi JYOUSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECO...
- Publication number 20080091381
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Kunie OGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECO...
- Publication number 20080074657
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- Yoshihiro Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20050271382
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing system and substrate processing method
- Publication number 20020168191
- Publication date Nov 14, 2002
- Yuji Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus and information storage apparatus and method
- Publication number 20020145922
- Publication date Oct 10, 2002
- TOKYO ELECTRON LIMITED
- Yuji Yoshimoto
- G11 - INFORMATION STORAGE
Information Patent Application
Substrate processing apparatus and information storage apparatus an...
- Publication number 20020116076
- Publication date Aug 22, 2002
- TOKYO ELECTRON LIMITED
- Yuji Yoshimoto
- G05 - CONTROLLING REGULATING
Information Patent Application
Coating film forming apparatus and coating film forming method
- Publication number 20020053321
- Publication date May 9, 2002
- TOKYO ELECTRON LIMITED
- Hiroshi Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist pattern forming apparatus and method thereof
- Publication number 20020037462
- Publication date Mar 28, 2002
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus
- Publication number 20020009658
- Publication date Jan 24, 2002
- TOKYO ELECTRON LIMITED
- Norikatsu Sato
- G01 - MEASURING TESTING
Information Patent Application
Parts maintenance managing system
- Publication number 20010041076
- Publication date Nov 15, 2001
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist processing method
- Publication number 20010028442
- Publication date Oct 11, 2001
- TOKYO ELECTRON LIMITED
- Yuji Fukuda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20010022897
- Publication date Sep 20, 2001
- TOKYO ELECTRON LIMITED
- Kunie Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating film forming apparatus and coating film forming method
- Publication number 20010016225
- Publication date Aug 23, 2001
- Kunie Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Kunie Ogata

Person

Patents Grantslast 30 patents

Substrate processing method

Substrate treatment apparatus, substrate treatment method and non-t...

Substrate processing method, computer-readable storage medium, and...

Substrate processing method, computer-readable storage medium and s...

Substrate processing method and apparatus

Temperature setting method and apparatus for a thermal processing p...

Substrate measuring method, computer-readable recording medium reco...

Substrate processing method, computer-readable storage medium and s...

Substrate processing method, computer-readable storage medium, and...

Temperature setting method of thermal processing plate, computer-re...

Temperature setting method for thermal processing plate, temperatur...

Temperature setting method of thermal processing plate, computer-re...

Substrate processing method, program, computer-readable storage med...

Substrate-processing apparatus, substrate-processing method, substr...

Substrate-processing apparatus, substrate-processing method, substr...

Substrate-processing apparatus, substrate-processing method, substr...

Substrate measuring method, computer-readable recording medium reco...

Resist pattern forming method

Resist pattern forming method

Resist pattern forming apparatus and method thereof

Processing apparatus and information storage apparatus and method

Substrate processing apparatus and information storage apparatus an...

Resist pattern forming apparatus and method thereof

Substrate processing system and substrate processing method

Substrate processing apparatus and method

Resist processing method controlled through reflectivity data

Substrate processing method and substrate processing apparatus

Substrate processing system and substrate processing method

Parts maintenance managing system

Resist coating and developing unit

Patents Applicationslast 30 patents

SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND NON-T...

Substrate Processing Apparatus and Substrate Processing Method

SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...

SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND...

RESIST PATTERN FORMING METHOD

SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...

SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND...

SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MED...

SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...

SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...

SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTR...

TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATUR...

TEMPERATURE SETTING METHOD FOR THERMAL PROCESSING PLATE, TEMPERATUR...

RESIST PATTERN FORMING METHOD

TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-RE...

TEMPERATURE SETTING METHOD OF THERMAL PROCESSING PLATE, COMPUTER-RE...

SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECO...

SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECO...

Resist pattern forming apparatus and method thereof

Substrate processing system and substrate processing method

Processing apparatus and information storage apparatus and method

Substrate processing apparatus and information storage apparatus an...

Coating film forming apparatus and coating film forming method

Resist pattern forming apparatus and method thereof

Substrate processing apparatus

Parts maintenance managing system

Resist processing method

Substrate processing method and substrate processing apparatus

Coating film forming apparatus and coating film forming method