Kunito Hayashi

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Aberration evaluation pattern, aberration evaluation method, aberra...
- Patent number 8,158,310
- Issue date Apr 17, 2012
- Ricoh Company, Ltd.
- Hiroyuki Miyata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electron-beam writing device and electron-beam writing method
- Patent number 6,989,536
- Issue date Jan 24, 2006
- Konica Minolta Holdings, Inc.
- Osamu Masuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ABERRATION EVALUATION PATTERN, ABERRATION EVALUATION METHOD, ABERRA...
- Publication number 20100227200
- Publication date Sep 9, 2010
- RICOH COMPANY, LTD.
- Hiroyuki Miyata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-beam writing device and electron-beam writing method
- Publication number 20050018496
- Publication date Jan 27, 2005
- Konica Minolta Holdings, Inc.
- Osamu Masuda
- B82 - NANO-TECHNOLOGY