Kuo-Kuei Fu

Person

Taoyuan County, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Mask pattern analysis apparatus and method for analyzing mask pattern
- Patent number 8,831,333
- Issue date Sep 9, 2014
- Nanya Technology Corporation
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-optical proximity correction photoresist pattern collapse rule
- Patent number 8,533,638
- Issue date Sep 10, 2013
- Nanya Technology Corporation
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring pattern, and pattern stitch monitoring method and wafer...
- Patent number 8,497,568
- Issue date Jul 30, 2013
- Nanya Technology Corporation
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Replaced photomask
- Patent number 8,192,902
- Issue date Jun 5, 2012
- Nanya Technology Corp.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching method for designing layout patterns on a photomask from i...
- Patent number 7,984,392
- Issue date Jul 19, 2011
- Nanya Technology Corp.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask and method for forming a pattern
- Patent number 7,811,723
- Issue date Oct 12, 2010
- Nanya Technology Corp.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK PATTERN ANALYSIS APPARATUS AND METHOD FOR ANALYZING MASK PATTERN
- Publication number 20130336571
- Publication date Dec 19, 2013
- NANYA TECHNOLOGY CORPORATION
- Kuo Kuei FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL OF DEFINING A PHOTORESIST PATTERN COLLAPSE RULE, AND PHOTOMAS...
- Publication number 20120258386
- Publication date Oct 11, 2012
- NANYA TECHNOLOGY CORPORATION
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MATCHING ASSISTANT FEATURE TOOLS
- Publication number 20120259445
- Publication date Oct 11, 2012
- NANYA TECHNOLOGY CORPORATION
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONITORING PATTERN, AND PATTERN STITCH MONITORING METHOD AND WAFER...
- Publication number 20120256298
- Publication date Oct 11, 2012
- NANYA TECHNOLOGY CORPORATION
- Kuo Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING METHOD OF PATTERN LAYOUTS FROM INVERSE LITHOGRAPHY
- Publication number 20110207034
- Publication date Aug 25, 2011
- NANYA TECHNOLOGY CORP.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING METHOD OF PATTERN LAYOUTS FROM INVERSE LITHOGRAPHY
- Publication number 20100104954
- Publication date Apr 29, 2010
- NANYA TECHNOLOGY CORP.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN
- Publication number 20090155699
- Publication date Jun 18, 2009
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kuo-Kuei Fu

Person

Patents Grantslast 30 patents

Mask pattern analysis apparatus and method for analyzing mask pattern

Post-optical proximity correction photoresist pattern collapse rule

Monitoring pattern, and pattern stitch monitoring method and wafer...

Replaced photomask

Matching method for designing layout patterns on a photomask from i...

Phase-shift mask and method for forming a pattern

Patents Applicationslast 30 patents

MASK PATTERN ANALYSIS APPARATUS AND METHOD FOR ANALYZING MASK PATTERN

MODEL OF DEFINING A PHOTORESIST PATTERN COLLAPSE RULE, AND PHOTOMAS...

METHOD FOR MATCHING ASSISTANT FEATURE TOOLS

MONITORING PATTERN, AND PATTERN STITCH MONITORING METHOD AND WAFER...

MATCHING METHOD OF PATTERN LAYOUTS FROM INVERSE LITHOGRAPHY

MATCHING METHOD OF PATTERN LAYOUTS FROM INVERSE LITHOGRAPHY

PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN