Kuo-Yi Chao

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Structure and formation method of semiconductor device with contact...
- Patent number 12,363,947
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Chieh Wu
Information Patent Grant
Dielectric isolation structure for multi-gate transistors
- Patent number 12,349,381
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jen-Hong Chang
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 12,342,598
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Different via configurations for different via interface requirements
- Patent number 12,278,188
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming air spacers in semiconductor devices
- Patent number 12,243,940
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric fin structure
- Patent number 12,230,712
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Shan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mandrel structures and methods of fabricating the same in semicondu...
- Patent number 12,176,212
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming fin field effect transistor (FinFET) device stru...
- Patent number 12,176,435
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and methods of forming the same
- Patent number 12,166,076
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Different via configurations for different via interface requirements
- Patent number 12,142,565
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Via-first process for connecting a contact and a gate electrode
- Patent number 12,125,743
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming the same
- Patent number 12,125,851
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Szu-Wei Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor (FinFET) device structure with isolatio...
- Patent number 12,107,166
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Huai Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 12,068,201
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Chieh Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tapered dielectric layer for preventing electrical shorting between...
- Patent number 12,062,692
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Wen Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive features having varying resistance
- Patent number 12,057,392
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-En Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing interconnect structures in semiconductor devices
- Patent number 11,978,664
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pang-Sheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact formation method and related structure
- Patent number 11,915,971
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 11,901,426
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric isolation structure for multi-gate transistors
- Patent number 11,888,049
- Issue date Jan 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact electrical connection that can be used to form an SRAM cell...
- Patent number 11,856,745
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical interconnect features and methods of forming
- Patent number 11,855,154
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric fin structure
- Patent number 11,735,665
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Shan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,721,590
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Chieh Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming air spacers in semiconductor devices
- Patent number 11,682,729
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Via-first process for connecting a contact and a gate electrode
- Patent number 11,670,544
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact electrical connection that can be used to form an SRAM cell...
- Patent number 11,621,267
- Issue date Apr 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuan Lin
- G11 - INFORMATION STORAGE
Information Patent Grant
Dielectric isolation structure for multi-gate transistors
- Patent number 11,532,733
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming metal contacts on metal gates
- Patent number 11,532,717
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Different via configurations for different via interface requirements
- Patent number 11,532,561
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20250239527
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC FIN STRUCTURE
- Publication number 20250194141
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Shan Lu
Information Patent Application
MANDREL STRUCTURES AND METHODS OF FABRICATING THE SAME IN SEMICONDU...
- Publication number 20250118559
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMING THE SAME
- Publication number 20250056851
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR DEVICE
- Publication number 20250015080
- Publication date Jan 9, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Wei Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Contacts on Metal Gates and Methods Thereof
- Publication number 20240379378
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Pang-Sheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIA-FIRST PROCESS FOR CONNECTING A CONTACT AND A GATE ELECTRODE
- Publication number 20240371687
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20240363427
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Chieh Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE FEATURES HAVING VARYING RESISTANCE
- Publication number 20240355730
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-En Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing Interconnect Structures In Semiconductor Devices
- Publication number 20240290654
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pang-Sheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METAL CONTACTS ON METAL GATES
- Publication number 20240250139
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS
- Publication number 20240194767
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FORMATION METHOD AND RELATED STRUCTURE
- Publication number 20240194520
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chao-Hsun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT ELECTRICAL CONNECTION THAT CAN BE USED TO FORM AN SRAM CELL...
- Publication number 20240098960
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- YU-KUAN LIN
- G11 - INFORMATION STORAGE
Information Patent Application
DIELECTRIC FIN STRUCTURE
- Publication number 20230369495
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Shan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230367220
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsieh-Yu WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENT VIA CONFIGURATIONS FOR DIFFERENT VIA INTERFACE REQUIREMENTS
- Publication number 20230343712
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20230326804
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Chieh Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Air Spacers In Semicondutor Devices
- Publication number 20230327021
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIA-FIRST PROCESS FOR CONNECTING A CONTACT AND A GATE ELECTRODE
- Publication number 20230253244
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT ELECTRICAL CONNECTION THAT CAN BE USED TO FORM AN SRAM CELL...
- Publication number 20230240060
- Publication date Jul 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- YU-KUAN LIN
- G11 - INFORMATION STORAGE
Information Patent Application
Forming Metal Contacts on Metal Gates
- Publication number 20230121981
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS
- Publication number 20230098409
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tapered Dielectric Layer for Preventing Electrical Shorting Between...
- Publication number 20230067804
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Wen Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mandrel Structures and Methods of Fabricating the Same in Semicondu...
- Publication number 20230062305
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH CONTACT...
- Publication number 20230033570
- Publication date Feb 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chieh WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS
- Publication number 20220416058
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Hong Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polishing Interconnect Structures In Semiconductor Devices
- Publication number 20220384244
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pang-Sheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source/Drain Via Having Reduced Resistance
- Publication number 20220359675
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Po-Yu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20220359399
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS

Kuo-Yi Chao

Person

Patents Grantslast 30 patents

Structure and formation method of semiconductor device with contact...

Dielectric isolation structure for multi-gate transistors

Forming metal contacts on metal gates

Different via configurations for different via interface requirements

Methods of forming air spacers in semiconductor devices

Dielectric fin structure

Mandrel structures and methods of fabricating the same in semicondu...

Method for forming fin field effect transistor (FinFET) device stru...

Semiconductor device and methods of forming the same

Different via configurations for different via interface requirements

Via-first process for connecting a contact and a gate electrode

FinFET device and method of forming the same

Fin field effect transistor (FinFET) device structure with isolatio...

Semiconductor devices

Tapered dielectric layer for preventing electrical shorting between...

Conductive features having varying resistance

Polishing interconnect structures in semiconductor devices

Contact formation method and related structure

Forming metal contacts on metal gates

Dielectric isolation structure for multi-gate transistors

Compact electrical connection that can be used to form an SRAM cell...

Vertical interconnect features and methods of forming

Dielectric fin structure

Semiconductor device and method

Methods of forming air spacers in semiconductor devices

Via-first process for connecting a contact and a gate electrode

Compact electrical connection that can be used to form an SRAM cell...

Dielectric isolation structure for multi-gate transistors

Forming metal contacts on metal gates

Different via configurations for different via interface requirements

Patents Applicationslast 30 patents

Different Via Configurations for Different Via Interface Requirements

DIELECTRIC FIN STRUCTURE

MANDREL STRUCTURES AND METHODS OF FABRICATING THE SAME IN SEMICONDU...

SEMICONDUCTOR DEVICE AND METHODS OF FORMING THE SAME

FIN-TYPE FIELD EFFECT TRANSISTOR DEVICE

Metal Contacts on Metal Gates and Methods Thereof

VIA-FIRST PROCESS FOR CONNECTING A CONTACT AND A GATE ELECTRODE

SEMICONDUCTOR DEVICES

CONDUCTIVE FEATURES HAVING VARYING RESISTANCE

Polishing Interconnect Structures In Semiconductor Devices

FORMING METAL CONTACTS ON METAL GATES

DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS

CONTACT FORMATION METHOD AND RELATED STRUCTURE

COMPACT ELECTRICAL CONNECTION THAT CAN BE USED TO FORM AN SRAM CELL...

DIELECTRIC FIN STRUCTURE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

DIFFERENT VIA CONFIGURATIONS FOR DIFFERENT VIA INTERFACE REQUIREMENTS

SEMICONDUCTOR DEVICE AND METHOD

Methods Of Forming Air Spacers In Semicondutor Devices

VIA-FIRST PROCESS FOR CONNECTING A CONTACT AND A GATE ELECTRODE

COMPACT ELECTRICAL CONNECTION THAT CAN BE USED TO FORM AN SRAM CELL...

Forming Metal Contacts on Metal Gates

DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS

Tapered Dielectric Layer for Preventing Electrical Shorting Between...

Mandrel Structures and Methods of Fabricating the Same in Semicondu...

STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH CONTACT...

DIELECTRIC ISOLATION STRUCTURE FOR MULTI-GATE TRANSISTORS

Polishing Interconnect Structures In Semiconductor Devices

Source/Drain Via Having Reduced Resistance

Different Via Configurations for Different Via Interface Requirements