Kurt Matoy

Person

Villach, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming an aluminum oxide layer, metal surface with alumi...
- Patent number 11,424,201
- Issue date Aug 23, 2022
- Infineon Technologies AG
- Michael Rogalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an integrated resistor and method of...
- Patent number 10,957,686
- Issue date Mar 23, 2021
- Infineon Technologies AG
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including an integrated resistor
- Patent number 10,586,792
- Issue date Mar 10, 2020
- Infineon Technologies AG
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a porous metal layer and an electronic...
- Patent number 10,515,910
- Issue date Dec 24, 2019
- Infineon Technologies AG
- Martin Mischitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metallization layers for semiconductor devices and methods of formi...
- Patent number 10,439,062
- Issue date Oct 8, 2019
- Infineon Technologies AG
- Bernhard Goller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including transistor device
- Patent number 10,186,508
- Issue date Jan 22, 2019
- Infineon Technologies AG
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Passivation layer and method of making a passivation layer
- Patent number 9,728,480
- Issue date Aug 8, 2017
- Infineon Technologies AG
- Kurt Matoy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer stack
- Patent number 9,006,899
- Issue date Apr 14, 2015
- Infineon Technologies AG
- Paul Ganitzer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit including power transistor cells and a connectin...
- Patent number 8,502,274
- Issue date Aug 6, 2013
- Infineon Technologies AG
- Kurt Matoy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Device Including an Integrated Resistor
- Publication number 20200152621
- Publication date May 14, 2020
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Including an Integrated Resistor
- Publication number 20190157259
- Publication date May 23, 2019
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming an Aluminum Oxide Layer, Metal Surface with Alumi...
- Publication number 20180366427
- Publication date Dec 20, 2018
- INFINEON TECHNOLOGIES AG
- Michael Rogalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Including Transistor Device
- Publication number 20180114788
- Publication date Apr 26, 2018
- INFINEON TECHNOLOGIES AG
- Dirk Ahlers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metallization Layers for Semiconductor Devices and Methods of Formi...
- Publication number 20180076321
- Publication date Mar 15, 2018
- INFINEON TECHNOLOGIES AG
- Bernhard Goller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND AN ELECTRONIC DEVICE
- Publication number 20160133584
- Publication date May 12, 2016
- INFINEON TECHNOLOGIES AG
- Martin Mischitz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A STRESS-COMPENSATED CHIP ELECTRODE
- Publication number 20160126197
- Publication date May 5, 2016
- INFINEON TECHNOLOGIES AG
- Kurt Matoy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Passivation Layer and Method of Making a Passivation Layer
- Publication number 20150235917
- Publication date Aug 20, 2015
- INFINEON TECHNOLOGIES AG
- Kurt Matoy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabricating a Layer Stack
- Publication number 20140167270
- Publication date Jun 19, 2014
- INFINEON TECHNOLOGIES AG
- Paul Ganitzer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Passivation Layer and Method of Making a Passivation Layer
- Publication number 20140117511
- Publication date May 1, 2014
- INFINEON TECHNOLOGIES AG
- Kurt Matoy
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of forming an aluminum oxide layer, metal surface with alumi...

Semiconductor device including an integrated resistor and method of...

Semiconductor device including an integrated resistor

Semiconductor device having a porous metal layer and an electronic...

Metallization layers for semiconductor devices and methods of formi...

Semiconductor device including transistor device

Passivation layer and method of making a passivation layer

Layer stack

Integrated circuit including power transistor cells and a connectin...

Patents Applicationslast 30 patents

Semiconductor Device Including an Integrated Resistor

Semiconductor Device Including an Integrated Resistor

Method of Forming an Aluminum Oxide Layer, Metal Surface with Alumi...

Semiconductor Device Including Transistor Device

Metallization Layers for Semiconductor Devices and Methods of Formi...

SEMICONDUCTOR DEVICE AND AN ELECTRONIC DEVICE

SEMICONDUCTOR DEVICE HAVING A STRESS-COMPENSATED CHIP ELECTRODE

Passivation Layer and Method of Making a Passivation Layer

Method of Fabricating a Layer Stack

Passivation Layer and Method of Making a Passivation Layer