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last 30 patents
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Patent Grant
Formulations for high porosity chemical mechanical polishing pads w...
Patent number
11,772,230
Issue date
Oct 3, 2023
Rohm and Haas Electronic Materials CMP Holdings Inc.
Jing Ren
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES
Publication number
20220356065
Publication date
Nov 10, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Changzai Chi
C01 - INORGANIC CHEMISTRY
Information
Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD
Publication number
20220348790
Publication date
Nov 3, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Changzai Chi
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS W...
Publication number
20220226960
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Jing Ren
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...