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Kwok Keung Paul Ho
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Singapore, SG
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last 30 patents
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Patent Grant
Plasma etch method for forming plasma etched silicon layer
Patent number
6,877,517
Issue date
Apr 12, 2005
Chartered Semiconductor Manufacturing Ltd.
Kwok Keung Paul Ho
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Plasma etch method for forming plasma etched silicon layer
Publication number
20040110389
Publication date
Jun 10, 2004
Chartered Semiconductor Manufacturing Ltd.
Kwok Keung Paul Ho
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method to form self-aligned anti-via interconnects
Publication number
20020155693
Publication date
Oct 24, 2002
Chartered Semiconductor Manufacturing Ltd.
Sangki Hong
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of application of conductive cap-layer in flip-chip, cob, an...
Publication number
20020100794
Publication date
Aug 1, 2002
Chartered Semiconductor Manufacturing Ltd.
Kwok Keung Paul Ho
H01 - BASIC ELECTRIC ELEMENTS